WN

Wesley C. Natzle

IBM: 64 patents #1,202 of 70,183Top 2%
TL Tokyo Electron Limited: 7 patents #1,084 of 5,567Top 20%
SA Siemens Aktiengesellschaft: 2 patents #6,658 of 22,248Top 30%
Overall (All Time): #33,010 of 4,157,543Top 1%
66
Patents All Time

Issued Patents All Time

Showing 25 most recent of 66 patents

Patent #TitleCo-InventorsDate
9263276 High-k/metal gate transistor with L-shaped gate encapsulation layer Renee T. Mo, Vijay Narayanan, Jeffrey W. Sleight 2016-02-16
9252018 High-k/metal gate transistor with L-shaped gate encapsulation layer Renee T. Mo, Vijay Narayanan, Jeffrey W. Sleight 2016-02-02
8900961 Selective deposition of germanium spacers on nitride Ashima B. Chakravarti, Anthony I. Chou, Toshiharu Furukawa, Steven J. Holmes 2014-12-02
8575709 High-k dielectric gate structures resistant to oxide growth at the dielectric/silicon substrate interface and methods of manufacture thereof Huiming Bu, Michael P. Chudzik, Wei He, William K. Henson, Siddarth A. Krishnan +2 more 2013-11-05
8492803 Field effect device with reduced thickness gate Ricky S. Amos, Siddhartha Panda, Brian L. Tessier 2013-07-23
8318565 High-k dielectric gate structures resistant to oxide growth at the dielectric/silicon substrate interface and methods of manufacture thereof Huiming Bu, Michael P. Chudzik, Wei He, William K. Henson, Siddarth A. Krishnan +2 more 2012-11-27
8198103 Addition of ballast hydrocarbon gas to doped polysilicon etch masked by resist Timothy J. Dalton, Paul W. Pastel, Richard S. Wise, Hongwen Yan, Ying Zhang 2012-06-12
7955926 Structure and method to control oxidation in high-k gate structures Renee T. Mo, Rashmi Jha, Kathryn T. Schonenberg, Richard A. Conti 2011-06-07
7859013 Metal oxide field effect transistor with a sharp halo Huajie Chen, Judson R. Holt, Rangarajan Jagannathan, Michael Sievers, Richard S. Wise 2010-12-28
7851299 Subgroundrule space for improved metal high-k device 2010-12-14
7705385 Selective deposition of germanium spacers on nitride Ashima B. Chakravarti, Anthony I. Chou, Toshiharu Furukawa, Steven J. Holmes 2010-04-27
7567700 Dynamic metrology sampling with wafer uniformity control Merritt Funk, Radha Sundararajan, Daniel Prager 2009-07-28
7502709 Dynamic metrology sampling for a dual damascene process Merritt Funk, Radha Sundararajan, Daniel Prager 2009-03-10
7502660 Feature dimension deviation correction system, method and program product David V. Horak, Merritt Funk, Kevin Lally, Daniel Prager 2009-03-10
7498271 Nitrogen based plasma process for metal gate MOS device Ricardo A. Donaton, Rashmi Jha, Siddarth A. Krishnan, Xi Li, Renee T. Mo +3 more 2009-03-03
7470629 Structure and method to fabricate finfet devices Bruce B. Doris 2008-12-30
7459382 Field effect device with reduced thickness gate Ricky S. Amos, Siddhartha Panda, Brian L. Tessier 2008-12-02
7451011 Process control using physical modules and virtual modules Merritt Funk 2008-11-11
7384835 Metal oxide field effect transistor with a sharp halo and a method of forming the transistor Huajie Chen, Judson R. Holt, Rangarajan Jagannathan, Michael Sievers, Richard S. Wise 2008-06-10
7344983 Clustered surface preparation for silicide and metal contacts Sadanand V. Deshpande, Ying Li, Kevin E. Mello, Renee T. Mo, Kirk D. Peterson +1 more 2008-03-18
7344965 Method of etching dual pre-doped polysilicon gate stacks using carbon-containing gaseous additions Ying Zhang, Timothy J. Dalton 2008-03-18
7292906 Formula-based run-to-run control Merritt Funk, Kevin Pinto, Asao Yamashita 2007-11-06
7289864 Feature dimension deviation correction system, method and program product David V. Horak, Merritt Funk, Kevin Lally, Daniel Prager 2007-10-30
7212878 Wafer-to-wafer control using virtual modules Merritt Funk 2007-05-01
7211496 Freestanding multiplayer IC wiring structure 2007-05-01