Issued Patents All Time
Showing 25 most recent of 131 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11536708 | Methods to fabricate dual pore devices | Mark Saly, Keenan N. Woods, Joseph R. Johnson, Bhaskar Jyoti Bhuyan, William J. Durand +2 more | 2022-12-27 |
| 9911597 | Trench metal insulator metal capacitor with oxygen gettering layer | Takashi Ando, Eduard A. Cartier, Aritra Dasgupta, Herbert L. Ho, Donghun Kang +3 more | 2018-03-06 |
| 9831084 | Hydroxyl group termination for nucleation of a dielectric metallic oxide | Takashi Ando, Min Dai, Martin M. Frank, David F. Hilscher, Rishikesh Krishnan +3 more | 2017-11-28 |
| 9793216 | Fabrication of IC structure with metal plug | Joyeeta Nag, Jim Shih-Chun Liang, Domingo A. Ferrer Luppi, Atsushi Ogino, Andrew H. Simon | 2017-10-17 |
| 9748354 | Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof | Wei V. Tang, Paul F. Ma, Steven C. H. Hung, Siddarth A. Krishnan, Wenyu Zhang +6 more | 2017-08-29 |
| 9679810 | Integrated circuit having improved electromigration performance and method of forming same | Joyeeta Nag, Shishir Ray, Andrew H. Simon, Oleg Gluschenkov, Siddarth A. Krishnan | 2017-06-13 |
| 9673108 | Fabrication of higher-K dielectrics | Min Dai, Dominic J. Schepis, Shahab Siddiqui | 2017-06-06 |
| 9653534 | Trench metal-insulator-metal capacitor with oxygen gettering layer | Takashi Ando, Eduard A. Cartier, Aritra Dasgupta, Herbert L. Ho, Donghun Kang +3 more | 2017-05-16 |
| 9627508 | Replacement channel TFET | Siddarth A. Krishnan, Unoh Kwon, Vijay Narayanan, Jeffrey W. Sleight | 2017-04-18 |
| 9577100 | FinFET and nanowire semiconductor devices with suspended channel regions and gate structures surrounding the suspended channel regions | Kangguo Cheng, Eric C. Harley, Judson R. Holt, Yue Ke, Rishikesh Krishnan +2 more | 2017-02-21 |
| 9564505 | Changing effective work function using ion implantation during dual work function metal gate integration | Martin M. Frank, Herbert L. Ho, Mark J. Hurley, Rashmi Jha, Naim Moumen +3 more | 2017-02-07 |
| 9536985 | Epitaxial growth of material on source/drain regions of FinFET structure | Brian J. Greene, Eric C. Harley, Judson R. Holt, Yue Ke, Rishikesh Krishnan +2 more | 2017-01-03 |
| 9524986 | Trapping dislocations in high-mobility fins below isolation layer | Ramachandra Divakaruni, Judson R. Holt, Arvind Kumar, Unoh Kwon | 2016-12-20 |
| 9478425 | Fabrication of higher-k dielectrics | Min Dai, Dominic J. Schepis, Shahab Siddiqui | 2016-10-25 |
| 9437496 | Merged source drain epitaxy | Brian J. Greene, Edward P. Maciejewski, Kevin McStay, Shreesh Narasimha, Chengwen Pei +1 more | 2016-09-06 |
| 9431289 | Method and structure to reduce FET threshold voltage shift due to oxygen diffusion | Christopher V. Baiocco, Deleep R. Nair, Jay M. Shah | 2016-08-30 |
| 9397177 | Variable length multi-channel replacement metal gate including silicon hard mask | Siddarth A. Krishnan, Unoh Kwon | 2016-07-19 |
| 9373690 | Variable length multi-channel replacement metal gate including silicon hard mask | Siddarth A. Krishnan, Unoh Kwon | 2016-06-21 |
| 9373501 | Hydroxyl group termination for nucleation of a dielectric metallic oxide | Takashi Ando, Min Dai, Martin M. Frank, David F. Hilscher, Rishikesh Krishnan +3 more | 2016-06-21 |
| 9318336 | Non-volatile memory structure employing high-k gate dielectric and metal gate | Nicolas L. Breil, Rishikesh Krishnan, Siddarth A. Krishnan, Unoh Kwon | 2016-04-19 |
| 9293461 | Replacement metal gate structures for effective work function control | Unoh Kwon, Ravikumar Ramachandran | 2016-03-22 |
| 9257519 | Semiconductor device including graded gate stack, related method and design structure | Min Dai, Jinping Liu, Joseph F. Shepard, Jr., Keith Kwong Hon Wong | 2016-02-09 |
| 9252232 | Multi-plasma nitridation process for a gate dielectric | Barry P. Linder, Shahab Siddiqui | 2016-02-02 |
| 9236314 | High-K/metal gate stack using capping layer methods, IC and related transistors | Naim Moumen, Vijay Narayanan, Dae-Gyu Park, Vamsi K. Paruchuri | 2016-01-12 |
| 9196700 | Multi-plasma nitridation process for a gate dielectric | Barry P. Linder, Shahab Siddiqui | 2015-11-24 |