Issued Patents All Time
Showing 25 most recent of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12415824 | Molybdenum(0) precursors for deposition of molybdenum films | Chandan Kr Barik, John Sudijono, Chandan Das, Doreen Wei Ying Yong, Mark Saly +1 more | 2025-09-16 |
| 12334394 | Methods and apparatus for selective etch stop capping and selective via open for fully landed via on underlying metal | Suketu Arun Parikh, Mihaela Balseanu, Ning Li, Mark Saly, Aaron Dangerfield +2 more | 2025-06-17 |
| 12300491 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Thomas Knisley, Kelvin Chan, Regina Freed +3 more | 2025-05-13 |
| 12291779 | Methods of selective atomic layer deposition | Mark Saly, David Thompson, Tobin Kaufman-Osborn, Kurt Fredrickson, Thomas Knisley +1 more | 2025-05-06 |
| 12281382 | Methods for depositing blocking layers on conductive surfaces | Lakmal C. Kalutarage, Aaron Dangerfield, Feng Q. Liu, Mark Saly, Michael Haverty +1 more | 2025-04-22 |
| 12272551 | Selective metal removal with flowable polymer | Liqi Wu, Feng Q. Liu, James Hugh Connolly, Zhimin QI, Jie Zhang +7 more | 2025-04-08 |
| 12261049 | Selective etch of a substrate | David Thompson, Mark Saly, Lisa J. Enman, Aaron Dangerfield, Jesus Candelario Mendoza +2 more | 2025-03-25 |
| 12142477 | Chalcogen precursors for deposition of silicon nitride | Chandan Kr Barik, Michael Haverty, Muthukumar Kaliappan, Cong Trinh, John Sudijono +3 more | 2024-11-12 |
| 12131900 | Methods for depositing blocking layers on metal surfaces | Mark Saly, Lakmal C. Kalutarage, Thomas Knisley | 2024-10-29 |
| 12110584 | Low temperature growth of transition metal chalcogenides | Chandan Das, Susmit Singha Roy, John Sudijono, Abhijit Basu Mallick, Mark Saly | 2024-10-08 |
| 12094766 | Selective blocking of metal surfaces using bifunctional self-assembled monolayers | Michael L. McSwiney, Mark Saly, Drew Phillips, Aaron Dangerfield, David Thompson +2 more | 2024-09-17 |
| 12068170 | Vapor phase thermal etch solutions for metal oxo photoresists | Lakmal C. Kalutarage, Mark Saly, Madhur Sachan, Regina Freed | 2024-08-20 |
| 12060370 | Molybdenum (0) precursors for deposition of molybdenum films | Andrea Leoncini, Paul Mehlmann, Nemanja Dordevic, Han Vinh Huynh, Doreen Wei Ying Yong +1 more | 2024-08-13 |
| 12040427 | Preclean and encapsulation of microLED features | Thomas Knisley, Mark Saly, Mingwei Zhu | 2024-07-16 |
| 12033866 | Vapor phase thermal etch solutions for metal oxo photoresists | Lakmal C. Kalutarage, Mark Saly, Madhur Sachan, Regina Freed | 2024-07-09 |
| 12031209 | Reducing agents for atomic layer deposition | Mark Saly, Lakmal C. Kalutarage, Thomas Knisley | 2024-07-09 |
| 12014925 | Metal-doped carbon hardmasks | Eswaranand Venkatasubramanian, Mark Saly, Abhijit Basu Mallick | 2024-06-18 |
| 11987875 | Semiconductor device patterning methods | Yong Wang, Doreen Wei Ying Yong, John Sudijono | 2024-05-21 |
| 11990369 | Selective patterning with molecular layer deposition | Zeqing Shen, Susmit Singha Roy, Abhijit Basu Mallick | 2024-05-21 |
| 11990332 | Methods and apparatus for deposition of low-k films | Mark Saly, Zhelin Sun, Ning Li, Mihaela Balseanu, Li-Qun Xia +2 more | 2024-05-21 |
| 11972940 | Area selective carbon-based film deposition | Xinke Wang, Zeqing Shen, Susmit Singha Roy, Abhijit Basu Mallick, Jiecong Tang +2 more | 2024-04-30 |
| 11970777 | Deposition of low-k films | Shuaidi Zhang, Ning Li, Mihaela Balseanu, Mark Saly, Thomas Knisley | 2024-04-30 |
| 11886120 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Thomas Knisley, Kelvin Chan, Regina Freed +3 more | 2024-01-30 |
| 11859278 | Molecular layer deposition of amorphous carbon films | Mark Saly, Ahbijit Basu Mallick, Eugene Yu Jin Kong, Bo Qi | 2024-01-02 |
| 11848229 | Selective blocking of metal surfaces using bifunctional self-assembled monolayers | Michael L. McSwiney, Mark Saly, Drew Phillips, Aaron Dangerfield, David Thompson +2 more | 2023-12-19 |