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Systems and methods for gated-insulator reconfigurable non-volatile memory devices |
Andrew Rush, Eric Herrmann |
2021-03-09 |
| 10854812 |
Systems and methods for gated-insulator reconfigurable non-volatile memory devices |
Andrew Rush, Eric Herrmann |
2020-12-01 |
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Systems and methods for gated-insulator reconfigurable non-volatile memory devices |
Andrew Rush, Eric Herrmann |
2020-02-04 |
| 9564505 |
Changing effective work function using ion implantation during dual work function metal gate integration |
Michael P. Chudzik, Martin M. Frank, Herbert L. Ho, Mark J. Hurley, Naim Moumen +3 more |
2017-02-07 |
| 8753936 |
Changing effective work function using ion implantation during dual work function metal gate integration |
Michael P. Chudzik, Martin M. Frank, Herbert L. Ho, Mark J. Hurley, Naim Moumen +3 more |
2014-06-17 |
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Nanoelectric memristor device with dilute magnetic semiconductors |
Jorhan Ordosgoitti, Branden Long |
2013-08-06 |
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Dual metal and dual dielectric integration for metal high-K FETs |
Michael P. Chudzik, Wiliam K. Henson, Yue Liang, Ravikumar Ramachandran, Richard S. Wise |
2013-05-07 |
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Gate effective-workfunction modification for CMOS |
Dae-Gyu Park, Michael P. Chudzik, Siddarth A. Krishnan, Naim Moumen, Vijay Narayanan +1 more |
2012-05-22 |
| 8138041 |
In-situ silicon cap for metal gate electrode |
Michael P. Chudzik, Troy L. Graves-Abe, Renee T. Mo, Keith Kwong Hon Wong |
2012-03-20 |
| 8120144 |
Method for forming dual high-K metal gate using photoresist mask and structures thereof |
Michael P. Chudzik, Naim Moumen, Keith Kwong Hon Wong, Ying H. Tsang |
2012-02-21 |
| 8053306 |
PFET with tailored dielectric and related methods and integrated circuit |
Rick Carter, Michael P. Chudzik, Naim Moumen |
2011-11-08 |
| 7955926 |
Structure and method to control oxidation in high-k gate structures |
Wesley C. Natzle, Renee T. Mo, Kathryn T. Schonenberg, Richard A. Conti |
2011-06-07 |
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Gate effective-workfunction modification for CMOS |
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2011-05-24 |
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Dual metal and dual dielectric integration for metal high-k FETs |
Michael P. Chudzik, Wiliam K. Henson, Yue Liang, Ravikumar Ramachandran, Richard S. Wise |
2011-05-17 |
| 7919379 |
Dielectric spacer removal |
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2011-04-05 |
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Method for forming dual high-k metal gate using photoresist mask and structures thereof |
Michael P. Chudzik, Naim Moumen, Keith Kwong Hon Wong, Ying H. Tsang |
2011-03-29 |
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Semiconductor device having dual metal gates and method of manufacture |
Unoh Kwon, Siddarth A. Krishnan, Takashi Ando, Michael P. Chudzik, Martin M. Frank +5 more |
2010-11-23 |
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Method for tuning the threshold voltage of a metal gate and high-k device |
Michael P. Chudzik, Michael A. Gribelyuk, Renee T. Mo, Naim Moumen, Keith Kwong Hon Wong |
2010-07-13 |
| 7498271 |
Nitrogen based plasma process for metal gate MOS device |
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2009-03-03 |
