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Water-based formulation of H2S/mercaptan scavenger for fluids in oilfield and refinery applications |
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Method of enhancing photoresist adhesion to rare earth oxides |
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Methods for removing a photoresist from a metal-comprising material |
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Method for forming dual high-K metal gate using photoresist mask and structures thereof |
Michael P. Chudzik, Rashmi Jha, Naim Moumen, Keith Kwong Hon Wong |
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Method of forming a semiconductor device |
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Method for forming dual high-k metal gate using photoresist mask and structures thereof |
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2011-03-29 |