Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11917998 | Disinfectant for hatcheries | Milind Limaye | 2024-03-05 |
| 9451684 | Dual pulse driven extreme ultraviolet (EUV) radiation source method | Daniel A. Corliss, Veeresh V. Deshpande, Oleg Gluschenkov, Sivarama Krishnan | 2016-09-20 |
| 9301381 | Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas | Daniel A. Corliss, Veeresh V. Deshpande, Oleg Gluschenkov, Sivarama Krishnan | 2016-03-29 |
| 7700425 | Raised source drain mosfet with amorphous notched gate cap layer with notch sidewalls passivated and filled with dielectric plug | Tina Wagner, Werner Rausch | 2010-04-20 |
| 7595010 | Method for producing a doped nitride film, doped oxide film and other doped films | Ashima B. Chakravarti, Judson R. Holt, Kevin K. Chan, Rangarajan Jagannathan | 2009-09-29 |
| 7479688 | STI stress modification by nitrogen plasma treatment for improving performance in small width devices | Bruce B. Doris, Werner Rausch, James A. Slinkman | 2009-01-20 |
| 7407875 | Low resistance contact structure and fabrication thereof | Keith Kwong Hon Wong, Patrick W. DeHaven, Anita Madan | 2008-08-05 |
| 7361611 | Doped nitride film, doped oxide film and other doped films | Ashima B. Chakravarti, Judson R. Holt, Kevin K. Chan, Rangarajan Jagannathan | 2008-04-22 |
| 7354867 | Etch process for improving yield of dielectric contacts on nickel silicides | Scott D. Allen, Kenneth Bandy, Richard S. Wise | 2008-04-08 |
| 7344983 | Clustered surface preparation for silicide and metal contacts | Ying Li, Kevin E. Mello, Renee T. Mo, Wesley C. Natzle, Kirk D. Peterson +1 more | 2008-03-18 |
| 7091081 | Method for patterning a semiconductor region | Rajiv Ranade, George Worth | 2006-08-15 |
| 6960510 | Method of making sub-lithographic features | Toshiharu Furukawa, David V. Horak, Wesley C. Natzle, Akihisa Sekiguchi, Len Yuan Tsou +1 more | 2005-11-01 |
| 6930030 | Method of forming an electronic device on a recess in the surface of a thin film of silicon etched to a precise thickness | Werner Rausch, Tina Wagner | 2005-08-16 |
| 6903023 | In-situ plasma etch for TERA hard mask materials | Richard S. Wise, Wendy Yan, Soctt D. Allen, Arpan Mahorowala | 2005-06-07 |
| 6887798 | STI stress modification by nitrogen plasma treatment for improving performance in small width devices | Bruce B. Doris, Werner Rausch, James A. Slinkman | 2005-05-03 |
| 6884734 | Vapor phase etch trim structure with top etch blocking layer | Frederick Buehrer, Derek Chen, William Chu, Scott W. Crowder, David V. Horak +4 more | 2005-04-26 |
| 6864041 | Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching | Jeffrey J. Brown, David V. Horak, Maheswaran Surendra, Len Yuan Tsou, Qingyun Yang +2 more | 2005-03-08 |
| 6790733 | Preserving TEOS hard mask using COR for raised source-drain including removable/disposable spacer | Wesley C. Natzle, Bruce B. Doris, Renee T. Mo, Patricia A. O'Neil | 2004-09-14 |
| 6512266 | Method of fabricating SiO2 spacers and annealing caps | Bruce B. Doris, Rajarao Jammy, William H. Ma | 2003-01-28 |