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Dry development of resists |
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Photoresist development with halide chemistries |
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Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement |
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Tin oxide mandrels in patterning |
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Tin oxide films in semiconductor device manufacturing |
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2020-01-28 |
| 10103056 |
Methods for wet metal seed deposition for bottom up gapfill of features |
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2018-10-16 |
