Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9412670 | System, method and apparatus for RF power compensation in plasma etch chamber | Robert Griffith O'Neill, Arthur H. Sato, Eric Tonnis, Seetharaman Ramachandran | 2016-08-09 |
| 8624210 | Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates | Yen-Kun Wang, Jason Autustino | 2014-01-07 |
| 8525139 | Method and apparatus of halogen removal | Harmeet Singh, Sanket Sant, Vahid Vahedi, Raphael Casaes, Seetharaman Ramachandran | 2013-09-03 |
| 8492736 | Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates | Yen-Kun Wang, Jason Augustino | 2013-07-23 |
| 8232538 | Method and apparatus of halogen removal using optimal ozone and UV exposure | Sanket Sant | 2012-07-31 |
| 8060330 | Method and system for centering wafer on chuck | Robert Griffith O'Neill, Jorge Luque, Harmeet Singh | 2011-11-15 |