Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10942507 | Eco-efficiency characterization tool | Mark Denome, Ashish Kumar, Vijai Thangamany, Somil Kapdia, Ching-Hong Hsieh | 2021-03-09 |
| 10607815 | Methods and apparatuses for plasma chamber matching and fault identification | Sathyendra Ghantasala, Hyun-Ho Doh | 2020-03-31 |
| 10553397 | Processing chamber hardware fault detection using spectral radio frequency analysis | Sathyendra Ghantasala, Hyun-Ho Doh | 2020-02-04 |
| 10460960 | Gas panel apparatus and method for reducing exhaust requirements | Ashish Kumar, Niladri Roy, Ramachandra Murthy Gunturi, Andreas Neuber, Stephen C. Wolgast | 2019-10-29 |
| 10283320 | Processing chamber hardware fault detection using spectral radio frequency analysis | Sathyendra Ghantasala, Hyun-Ho Doh | 2019-05-07 |
| 10185313 | Eco-efficiency characterization tool | Mark Denome, Ashish Kumar, Vijai Thangamany, Somil KAPADIA, Ching-Hong Hsieh | 2019-01-22 |
| 9589769 | Apparatus and method for efficient materials use during substrate processing | Richard J. Hertel, Vikram Singh, Ernest E. Allen | 2017-03-07 |
| 8989888 | Automatic fault detection and classification in a plasma processing system and methods thereof | Gunsu Yun | 2015-03-24 |
| 8983631 | Arrangement for identifying uncontrolled events at the process module level and methods thereof | Chung-Ho Huang, Connie Lam, Dragan Podlesnik | 2015-03-17 |
| 8650002 | Determining plasma processing system readiness without generating plasma | Brian Choi, Gunsu Yun, Norman Williams | 2014-02-11 |
| 8618807 | Arrangement for identifying uncontrolled events at the process module level and methods thereof | Luc Albarede | 2013-12-31 |
| 8538572 | Methods for constructing an optimal endpoint algorithm | Jiangxin Wang, Andrew Perry | 2013-09-17 |
| 8473089 | Methods and apparatus for predictive preventive maintenance of processing chambers | Luc Albarede, Eric A. Pape, Brian Choi | 2013-06-25 |
| 8358416 | Methods and apparatus for normalizing optical emission spectra | Eric A. Pape, Jean-Paul Booth | 2013-01-22 |
| 8295966 | Methods and apparatus to predict etch rate uniformity for qualification of a plasma chamber | Brian Choi, Gunsu Yun | 2012-10-23 |
| 8271121 | Methods and arrangements for in-situ process monitoring and control for plasma processing tools | Neil Benjamin | 2012-09-18 |
| 8144328 | Methods and apparatus for normalizing optical emission spectra | Eric A. Pape, Jean-Paul Booth | 2012-03-27 |
| 7907260 | Collimator arrangements including multiple collimators and implementation methods thereof | Eric A. Pape | 2011-03-15 |
| 7531369 | Process endpoint detection method using broadband reflectometry | — | 2009-05-12 |
| 7399711 | Method for controlling a recess etch process | Andrew Perry | 2008-07-15 |
| 7019844 | Method for in-situ monitoring of patterned substrate processing using reflectometry. | Andrew Perry | 2006-03-28 |
| 6979578 | Process endpoint detection method using broadband reflectometry | — | 2005-12-27 |
| 6939811 | Apparatus and method for controlling etch depth | Tom A. Kamp, Alan J. Miller | 2005-09-06 |