Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10796885 | Circuit for impedance matching between a generator and a load at multiple frequencies, assembly comprising such a circuit and related use | Erik Johnson | 2020-10-06 |
| 10319565 | Method and system for controlling ion flux in an RF plasma | Bastien Bruneau, Erik Johnson, Tatiana Novikova | 2019-06-11 |
| 9153421 | Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber | Mikio Nagai, Douglas Keil | 2015-10-06 |
| 9129779 | Processing system for detecting in-situ arcing events during substrate processing | Douglas Keil | 2015-09-08 |
| 8968838 | Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation | Erik Johnson | 2015-03-03 |
| 8894804 | Plasma unconfinement sensor and methods thereof | Alexei Marakhtanov, Rajinder Dhindsa, Luc Albarede, Seyed Jafar Jafarian-Tehrani | 2014-11-25 |
| 8849585 | Methods for automatically characterizing a plasma | Douglas Keil, Christopher Thorgrimsson | 2014-09-30 |
| 8780522 | Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereof | Douglas Keil | 2014-07-15 |
| 8547085 | Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber | Douglas Keil | 2013-10-01 |
| 8358416 | Methods and apparatus for normalizing optical emission spectra | Vijayakumar C. Venugopal, Eric A. Pape | 2013-01-22 |
| 8179152 | Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamber | Mikio Nagai, Douglas Keil | 2012-05-15 |
| 8164349 | Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof | Douglas Keil | 2012-04-24 |
| 8164353 | RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber | Luc Albarede, Jung-Hea Kim, Douglas Keil | 2012-04-24 |
| 8159233 | Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamber | Douglas Keil | 2012-04-17 |
| 8144328 | Methods and apparatus for normalizing optical emission spectra | Vijayakumar C. Venugopal, Eric A. Pape | 2012-03-27 |
| 5936413 | Method and device for measuring an ion flow in a plasma | Nicholas St. John Braithwaite | 1999-08-10 |