Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12387915 | Lower plasma exclusion zone ring for bevel etcher | Keechan Kim, Jack Chen | 2025-08-12 |
| 11756771 | Tunable upper plasma-exclusion-zone ring for a bevel etcher | Jack Chen, Adam Liron | 2023-09-12 |
| 10937634 | Tunable upper plasma-exclusion-zone ring for a bevel etcher | Jack Chen, Adam Liron | 2021-03-02 |
| 9881788 | Back side deposition apparatus and applications | Yunsang Kim, Kaushik Chattopadhyay, Youn Gi Hong | 2018-01-30 |
| 9564308 | Methods for processing bevel edge etching | Andrew D. Bailey, III, Andras Kuthi, Yunsang Kim | 2017-02-07 |
| 9184043 | Edge electrodes with dielectric covers | Andrew D. Bailey, III, Andras Kuthi, Yunsang Kim | 2015-11-10 |
| 9053925 | Configurable bevel etcher | Andrew D. Bailey, III, Alan M. Schoepp, Yunsang Kim, William S. Kennedy | 2015-06-09 |
| 8721908 | Bevel etcher with vacuum chuck | Andrew D. Bailey, III, Alan M. Schoepp, William S. Kennedy | 2014-05-13 |
| 8580078 | Bevel etcher with vacuum chuck | Andrew D. Bailey, III, Alan M. Schoepp, William S. Kennedy | 2013-11-12 |
| 8574397 | Bevel edge plasma chamber with top and bottom edge electrodes | Andrew D. Bailey, III, Andras Kuthi | 2013-11-05 |
| 8562266 | Flush mounted fastener for plasma processing apparatus | — | 2013-10-22 |
| 8398875 | Method of orienting an upper electrode relative to a lower electrode for bevel edge processing | Andrew D. Bailey, III, Alan M. Schoepp, John D. Boniface | 2013-03-19 |
| 8252140 | Plasma chamber for wafer bevel edge processing | Andrew D. Bailey, III, Andras Kuthi | 2012-08-28 |
| 7943007 | Configurable bevel etcher | Andrew D. Bailey, III, Alan M. Schoepp, Yunsang Kim, William S. Kennedy | 2011-05-17 |
| 7938931 | Edge electrodes with variable power | Andrew D. Bailey, III, Andras Kuthi | 2011-05-10 |
| 7922866 | Apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer | Andrew D. Bailey, III, Alan M. Schoepp, John D. Boniface | 2011-04-12 |
| 7858898 | Bevel etcher with gap control | Andrew D. Bailey, III, Alan M. Schoepp, Andras Kuthi, Yunsang Kim, William S. Kennedy | 2010-12-28 |
| 7662254 | Methods of and apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer | Andrew D. Bailey, III, Alan M. Schoepp, John D. Boniface | 2010-02-16 |
| 7575638 | Apparatus for defining regions of process exclusion and process performance in a process chamber | Andrew D. Bailey, III, Jack Chen, Yunsang Kim | 2009-08-18 |