| 12387915 |
Lower plasma exclusion zone ring for bevel etcher |
Keechan Kim, Jack Chen |
2025-08-12 |
| 11756771 |
Tunable upper plasma-exclusion-zone ring for a bevel etcher |
Jack Chen, Adam Liron |
2023-09-12 |
| 10937634 |
Tunable upper plasma-exclusion-zone ring for a bevel etcher |
Jack Chen, Adam Liron |
2021-03-02 |
| 9881788 |
Back side deposition apparatus and applications |
Yunsang Kim, Kaushik Chattopadhyay, Youn Gi Hong |
2018-01-30 |
| 9564308 |
Methods for processing bevel edge etching |
Andrew D. Bailey, III, Andras Kuthi, Yunsang Kim |
2017-02-07 |
| 9184043 |
Edge electrodes with dielectric covers |
Andrew D. Bailey, III, Andras Kuthi, Yunsang Kim |
2015-11-10 |
| 9053925 |
Configurable bevel etcher |
Andrew D. Bailey, III, Alan M. Schoepp, Yunsang Kim, William S. Kennedy |
2015-06-09 |
| 8721908 |
Bevel etcher with vacuum chuck |
Andrew D. Bailey, III, Alan M. Schoepp, William S. Kennedy |
2014-05-13 |
| 8580078 |
Bevel etcher with vacuum chuck |
Andrew D. Bailey, III, Alan M. Schoepp, William S. Kennedy |
2013-11-12 |
| 8574397 |
Bevel edge plasma chamber with top and bottom edge electrodes |
Andrew D. Bailey, III, Andras Kuthi |
2013-11-05 |
| 8562266 |
Flush mounted fastener for plasma processing apparatus |
— |
2013-10-22 |
| 8398875 |
Method of orienting an upper electrode relative to a lower electrode for bevel edge processing |
Andrew D. Bailey, III, Alan M. Schoepp, John D. Boniface |
2013-03-19 |
| 8252140 |
Plasma chamber for wafer bevel edge processing |
Andrew D. Bailey, III, Andras Kuthi |
2012-08-28 |
| 7943007 |
Configurable bevel etcher |
Andrew D. Bailey, III, Alan M. Schoepp, Yunsang Kim, William S. Kennedy |
2011-05-17 |
| 7938931 |
Edge electrodes with variable power |
Andrew D. Bailey, III, Andras Kuthi |
2011-05-10 |
| 7922866 |
Apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer |
Andrew D. Bailey, III, Alan M. Schoepp, John D. Boniface |
2011-04-12 |
| 7858898 |
Bevel etcher with gap control |
Andrew D. Bailey, III, Alan M. Schoepp, Andras Kuthi, Yunsang Kim, William S. Kennedy |
2010-12-28 |
| 7662254 |
Methods of and apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer |
Andrew D. Bailey, III, Alan M. Schoepp, John D. Boniface |
2010-02-16 |
| 7575638 |
Apparatus for defining regions of process exclusion and process performance in a process chamber |
Andrew D. Bailey, III, Jack Chen, Yunsang Kim |
2009-08-18 |
