Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12057295 | RF power compensation to reduce deposition or etch rate changes in response to substrate bulk resistivity variations | Wei Luo, WeiWu ZHONG, Himanshu Chokshi | 2024-08-06 |
| 9881788 | Back side deposition apparatus and applications | Yunsang Kim, Kaushik Chattopadhyay, Gregory Sexton | 2018-01-30 |
| 9466502 | Line width roughness improvement with noble gas plasma | Shih-Yuan Cheng, Shenjian Liu, Qian Fu | 2016-10-11 |
| 9263284 | Line width roughness improvement with noble gas plasma | Shih-Yuan Cheng, Shenjian Liu, Qian Fu | 2016-02-16 |
| 8753804 | Line width roughness improvement with noble gas plasma | Shih-Yuan Cheng, Shenjian Liu, Qian Fu | 2014-06-17 |