Issued Patents All Time
Showing 26–50 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8501283 | Methods for depositing bevel protective film | Neungho Shin, Patrick Chung | 2013-08-06 |
| 8440051 | Plasma processing chamber for bevel edge processing | Andrew D. Bailey, III | 2013-05-14 |
| 8430970 | Methods for preventing corrosion of plasma-exposed yttria-coated constituents | Ganapathy Swami, Peter Loewenhardt | 2013-04-30 |
| 8414790 | Bevel plasma treatment to enhance wet edge clean | Andrew D. Bailey, III | 2013-04-09 |
| 8398778 | Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter | Tong Fang, Keechan Kim, George Stojakovic | 2013-03-19 |
| 8349202 | Methods for controlling bevel edge etching in a plasma chamber | Tong Fang, Andrew D. Bailey, III, Olivier Rigoutat, George Stojakovic | 2013-01-08 |
| 8323523 | High pressure bevel etch process | Tong Fang, Andreas Fischer | 2012-12-04 |
| 8308896 | Methods to remove films on bevel edge and backside of wafer and apparatus thereof | Andrew D. Bailey, III | 2012-11-13 |
| 8298433 | Methods for removing an edge polymer from a substrate | Hyungsuk Alexander Yoon, Jason A. Ryder, Andrew D. Bailey, III | 2012-10-30 |
| 8268116 | Methods of and apparatus for protecting a region of process exclusion adjacent to a region of process performance in a process chamber | Andrew D. Bailey, III | 2012-09-18 |
| 8262923 | High pressure bevel etch process | Tong Fang, Andreas Fischer | 2012-09-11 |
| 8257503 | Method and apparatus for detecting plasma unconfinement | Keechan Kim, Andrew D. Bailey, III | 2012-09-04 |
| 8211238 | System, method and apparatus for self-cleaning dry etch | Andrew D. Bailey, III, Shrikant Lohokare, Arthur M. Howald | 2012-07-03 |
| 8137501 | Bevel clean device | Andrew D. Bailey, III, Greg Sexton, Keechan Kim, Andras Kuthi | 2012-03-20 |
| 8083890 | Gas modulation to control edge exclusion in a bevel edge etching plasma chamber | Tong Fang, Andrew D. Bailey, III, Olivier Rigoutat, George Stojakovic | 2011-12-27 |
| 7943007 | Configurable bevel etcher | Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton, William S. Kennedy | 2011-05-17 |
| 7909960 | Apparatus and methods to remove films on bevel edge and backside of wafer | Andrew D. Bailey, III | 2011-03-22 |
| 7858898 | Bevel etcher with gap control | Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton, Andras Kuthi, William S. Kennedy | 2010-12-28 |
| 7718542 | Low-k damage avoidance during bevel etch processing | Andrew D. Bailey, III, Jack Chen | 2010-05-18 |
| 7651585 | Apparatus for the removal of an edge polymer from a substrate and methods therefor | Hyungsuk Alexander Yoon, Jason A. Ryder, Andrew D. Bailey, III | 2010-01-26 |
| 7575638 | Apparatus for defining regions of process exclusion and process performance in a process chamber | Andrew D. Bailey, III, Jack Chen, Gregory Sexton | 2009-08-18 |
| 7540935 | Plasma oxidation and removal of oxidized material | Andrew D. Bailey, III, Hyungsuk Alexander Yoon, Arthur M. Howald | 2009-06-02 |
| 7435685 | Method of forming a low-K dual damascene interconnect structure | Gerardo Delgadino, Yan Ye, Neungho Shin, Li-Qun Xia, Tzu-Fang Huang +6 more | 2008-10-14 |
| 7316761 | Apparatus for uniformly etching a dielectric layer | Kenny L. Doan, Mahmoud Dahimene, Jingbao Liu, Bryan Pu, Hongqing Shan +1 more | 2008-01-08 |
| 7256134 | Selective etching of carbon-doped low-k dielectrics | Neungho Shin, Heeyeop Chae, Joey Chiu, Yan Ye, Fang Tian +1 more | 2007-08-14 |