| 10593520 |
Temperature adjusting apparatus and method for a focus ring |
Lei Wu, Rubin Ye |
2020-03-17 |
|
| 8936696 |
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
Roger Alan Lindley, Jingbao Liu, Keiji Horioka |
2015-01-20 |
$39,758,000 |
| 8609546 |
Pulsed bias plasma process to control microloading |
Wonchul Lee, Qian Fu, Shenjian Liu |
2013-12-17 |
$7,175,000 |
| 8518282 |
Method of controlling etch microloading for a tungsten-containing layer |
Wonchul Lee, Qian Fu, Shenjian Liu |
2013-08-27 |
$4,348,000 |
| 8231799 |
Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone |
Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more |
2012-07-31 |
$11,506,000 |
| 8187415 |
Plasma etch reactor with distribution of etch gases across a wafer surface and a polymer oxidizing gas in an independently fed center gas zone |
Jong Mun Kim, Jingbao Liu |
2012-05-29 |
$9,160,000 |
| 7879186 |
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
Roger Alan Lindley, Jingbao Liu, Keiji Horioka |
2011-02-01 |
$7,897,000 |
| 7838430 |
Plasma control using dual cathode frequency mixing |
Steven C. Shannon, Dennis S. Grimard, Theodoros Panagopoulos, Daniel J. Hoffman, Michael G. Chafin +4 more |
2010-11-23 |
$4,531,000 |
| 7807064 |
Halogen-free amorphous carbon mask etch having high selectivity to photoresist |
Jong Mun Kim, Judy Wang, Ajey M. Joshi, Jingbao Liu |
2010-10-05 |
$8,418,000 |
| 7736914 |
Plasma control using dual cathode frequency mixing and controlling the level of polymer formation |
Jingbao Liu, Taeho Shin |
2010-06-15 |
$8,018,000 |
| 7629255 |
Method for reducing microloading in etching high aspect ratio structures |
Qian Fu, Shenjian Liu, Wonchul Lee |
2009-12-08 |
$15,691,000 |
| 7540971 |
Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content |
Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more |
2009-06-02 |
$19,554,000 |
| 7541292 |
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones |
Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more |
2009-06-02 |
$19,554,000 |
| 7431859 |
Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation |
Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more |
2008-10-07 |
$9,830,000 |
| 7432210 |
Process to open carbon based hardmask |
Judy Wang, Shing-Li Sung, Shawming Ma |
2008-10-07 |
$9,830,000 |
| 7422654 |
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
Roger Alan Lindley, Jingbao Liu, Keiji Horioka |
2008-09-09 |
$16,131,000 |
| 7374636 |
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor |
Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Panyin Hughes +4 more |
2008-05-20 |
$13,768,000 |
| 7316199 |
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber |
Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Qi Li +3 more |
2008-01-08 |
$14,915,000 |
| 7316761 |
Apparatus for uniformly etching a dielectric layer |
Kenny L. Doan, Yunsang Kim, Mahmoud Dahimene, Jingbao Liu, Hongqing Shan +1 more |
2008-01-08 |
$14,915,000 |
| 6916399 |
Temperature controlled window with a fluid supply system |
Yan Rozenzon, Gil Lavi, Evans Lee, Dong Ho Choi, Matt Hamrah +3 more |
2005-07-12 |
|
| 6829056 |
Monitoring dimensions of features at different locations in the processing of substrates |
Michael Barnes, John D. Holland, II, Hongqing Shan, Mohit Jain, Zhifeng Sui +5 more |
2004-12-07 |
|
| 6825618 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
Hongching Shan, Claes Bjorkman, Kenny L. Doan, Mike Welch, Richard R. Mett |
2004-11-30 |
|
| 6797639 |
Dielectric etch chamber with expanded process window |
James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongching Shan, Claes Bjorkman +3 more |
2004-09-28 |
$20,273,000 |
| 6787475 |
Flash step preparatory to dielectric etch |
Zhuxu Wang, Jingbao Liu, Claes Bjorkman |
2004-09-07 |
|
| 6716302 |
Dielectric etch chamber with expanded process window |
James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongching Shan, Claes Bjorkman +3 more |
2004-04-06 |
$31,300,000 |
