Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11794441 | Bonding structure of e chuck to aluminum base configuration | Vijay D. Parkhe | 2023-10-24 |
| 11192323 | Bonding structure of e chuck to aluminum base configuration | Vijay D. Parkhe | 2021-12-07 |
| 10763150 | System for coupling a voltage to spatially segmented portions of the wafer with variable voltage | Philip Allan Kraus, Thai Cheng Chua | 2020-09-01 |
| 10688750 | Bonding structure of E chuck to aluminum base configuration | Vijay D. Parkhe | 2020-06-23 |
| 10153139 | Multiple electrode substrate support assembly and phase control system | Yang Yang, Kartik Ramaswamy, Steven Lane, Lawrence Wong, Shahid Rauf +2 more | 2018-12-11 |
| 8936696 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Jingbao Liu, Bryan Pu, Keiji Horioka | 2015-01-20 |
| 8617351 | Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction | Daniel J. Hoffman, Michael Kutney, Martin Jeff Salinas, Hamid Tavassoli, Keiji Horioka +1 more | 2013-12-31 |
| 8527081 | Method and apparatus for automated validation of semiconductor process recipes | Charles Hardy | 2013-09-03 |
| 8382939 | Plasma processing chamber with enhanced gas delivery | Michael Kutney | 2013-02-26 |
| 8092605 | Magnetic confinement of a plasma | Steven C. Shannon, Masao Drexel, James A. Stinnett, Ying Rui, Ying Xiao +1 more | 2012-01-10 |
| 8048328 | Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Scott A. Hogenson, Daniel J. Hoffman | 2011-11-01 |
| 7972469 | Plasma processing apparatus | Hiroji Hanawa, Andrew Nguyen, Keiji Horioka, Kallol Bera, Kenneth S. Collins +3 more | 2011-07-05 |
| 7883633 | Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Scott A. Hogenson, Daniel J. Hoffman | 2011-02-08 |
| 7879186 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Jingbao Liu, Bryan Pu, Keiji Horioka | 2011-02-01 |
| 7422654 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Jingbao Liu, Bryan Pu, Keiji Horioka | 2008-09-09 |
| 7374636 | Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor | Keiji Horioka, Chun Yan, Taeho Shin, Panyin Hughes, Douglas H. Burns +4 more | 2008-05-20 |
| 7316199 | Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber | Keiji Horioka, Chun Yan, Taeho Shin, Qi Li, Panyin Hughes +3 more | 2008-01-08 |
| 6326307 | Plasma pretreatment of photoresist in an oxide etch process | Henry Fong, Yunsang Kim, Takehito Komatsu, Ajey M. Joshi, Bryan Pu +1 more | 2001-12-04 |
| 6113731 | Magnetically-enhanced plasma chamber with non-uniform magnetic field | Hongching Shan, Claes Bjorkman, Xue-Yu Qian, Richard W. Plavidal, Bryan Pu +4 more | 2000-09-05 |
| 5989349 | Diagnostic pedestal assembly for a semiconductor wafer processing system | Kuang-Han Ke, Hongching Shan, Richard R. Mett | 1999-11-23 |