RL

Roger Alan Lindley

Applied Materials: 20 patents #657 of 7,310Top 9%
Overall (All Time): #219,972 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11794441 Bonding structure of e chuck to aluminum base configuration Vijay D. Parkhe 2023-10-24
11192323 Bonding structure of e chuck to aluminum base configuration Vijay D. Parkhe 2021-12-07
10763150 System for coupling a voltage to spatially segmented portions of the wafer with variable voltage Philip Allan Kraus, Thai Cheng Chua 2020-09-01
10688750 Bonding structure of E chuck to aluminum base configuration Vijay D. Parkhe 2020-06-23
10153139 Multiple electrode substrate support assembly and phase control system Yang Yang, Kartik Ramaswamy, Steven Lane, Lawrence Wong, Shahid Rauf +2 more 2018-12-11
8936696 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor Jingbao Liu, Bryan Pu, Keiji Horioka 2015-01-20
8617351 Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction Daniel J. Hoffman, Michael Kutney, Martin Jeff Salinas, Hamid Tavassoli, Keiji Horioka +1 more 2013-12-31
8527081 Method and apparatus for automated validation of semiconductor process recipes Charles Hardy 2013-09-03
8382939 Plasma processing chamber with enhanced gas delivery Michael Kutney 2013-02-26
8092605 Magnetic confinement of a plasma Steven C. Shannon, Masao Drexel, James A. Stinnett, Ying Rui, Ying Xiao +1 more 2012-01-10
8048328 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor Scott A. Hogenson, Daniel J. Hoffman 2011-11-01
7972469 Plasma processing apparatus Hiroji Hanawa, Andrew Nguyen, Keiji Horioka, Kallol Bera, Kenneth S. Collins +3 more 2011-07-05
7883633 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor Scott A. Hogenson, Daniel J. Hoffman 2011-02-08
7879186 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor Jingbao Liu, Bryan Pu, Keiji Horioka 2011-02-01
7422654 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor Jingbao Liu, Bryan Pu, Keiji Horioka 2008-09-09
7374636 Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor Keiji Horioka, Chun Yan, Taeho Shin, Panyin Hughes, Douglas H. Burns +4 more 2008-05-20
7316199 Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber Keiji Horioka, Chun Yan, Taeho Shin, Qi Li, Panyin Hughes +3 more 2008-01-08
6326307 Plasma pretreatment of photoresist in an oxide etch process Henry Fong, Yunsang Kim, Takehito Komatsu, Ajey M. Joshi, Bryan Pu +1 more 2001-12-04
6113731 Magnetically-enhanced plasma chamber with non-uniform magnetic field Hongching Shan, Claes Bjorkman, Xue-Yu Qian, Richard W. Plavidal, Bryan Pu +4 more 2000-09-05
5989349 Diagnostic pedestal assembly for a semiconductor wafer processing system Kuang-Han Ke, Hongching Shan, Richard R. Mett 1999-11-23