Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8413604 | Slotted electrostatic shield modification for improved etch and CVD process uniformity | Rene George, Andreas Kadavanich, Daniel J. Devine, Stephen E. Savas, John Zajac | 2013-04-09 |
| 7232767 | Slotted electrostatic shield modification for improved etch and CVD process uniformity | Rene George, Andreas Kadavanich, Daniel J. Devine, Stephen E. Savas, John Zajac | 2007-06-19 |
| 7105442 | Ashable layers for reducing critical dimensions of integrated circuit features | Kenny L. Doan, Jingbao Liu, Michael Barnes, Hong Dang Nguyen, Christopher Dennis Bencher +4 more | 2006-09-12 |
| 6825618 | Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply | Bryan Pu, Claes Bjorkman, Kenny L. Doan, Mike Welch, Richard R. Mett | 2004-11-30 |
| 6797639 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Claes Bjorkman +3 more | 2004-09-28 |
| 6716302 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Claes Bjorkman +3 more | 2004-04-06 |
| 6689249 | Shield or ring surrounding semiconductor workpiece in plasma chamber | Kuang-Han Ke, Bryan Pu, James C. Wang, Henry Fong, Zongyu LI +1 more | 2004-02-10 |
| 6613691 | Highly selective oxide etch process using hexafluorobutadiene | Raymond Hung, Joseph P. Caulfield, Ruiping Wang, Gerald Yin | 2003-09-02 |
| 6568346 | Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply | Bryan Pu, Claes Bjorkman, Kenny L. Doan, Mike Welch, Richard R. Mett | 2003-05-27 |
| 6513452 | Adjusting DC bias voltage in plasma chamber | Evans Lee, Michael Welch, Robert Wu, Bryan Pu, Paul Luscher +2 more | 2003-02-04 |
| 6432259 | Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates | Hamid Noorbakhsh, Michael Welch, Siamak Salimian, Paul Luscher, Kaushik Vaidya +2 more | 2002-08-13 |
| 6403491 | Etch method using a dielectric etch chamber with expanded process window | Jingbao Liu, Judy Wang, Takehiko Komatsu, Bryan Pu, Kenny L. Doan +4 more | 2002-06-11 |
| 6387288 | High selectivity etch using an external plasma discharge | Claes Bjorkman, Michael Welch | 2002-05-14 |
| 6284093 | Shield or ring surrounding semiconductor workpiece in plasma chamber | Kuang-Han Ke, Bryan Pu, James C. Wang, Henry Fong, Zongyu LI +1 more | 2001-09-04 |
| 6273022 | Distributed inductively-coupled plasma source | Bryan Pu, Claes Bjorkman, Kenny L. Doan, Mike Welch, Richard R. Mett | 2001-08-14 |
| 6221782 | Adjusting DC bias voltage in plasma chamber | Evans Lee, Michael Welch, Robert Wu, Bryan Pu, Paul Luscher +2 more | 2001-04-24 |
| 6189484 | Plasma reactor having a helicon wave high density plasma source | Gerald Yin, Chii Guang Lee, Arnold Kholodenko, Peter Loewenhardt, Diana Xiaobing Ma +1 more | 2001-02-20 |
| 6174451 | Oxide etch process using hexafluorobutadiene and related unsaturated hydrofluorocarbons | Raymond Hung, Joseph P. Caulfield, Ruiping Wang, Gerald Yin | 2001-01-16 |
| 6113731 | Magnetically-enhanced plasma chamber with non-uniform magnetic field | Roger Alan Lindley, Claes Bjorkman, Xue-Yu Qian, Richard W. Plavidal, Bryan Pu +4 more | 2000-09-05 |
| 6076482 | Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion | Ji Ding, James D. Carducci, Siamak Salimian, Evans Lee, Paul Luscher +1 more | 2000-06-20 |
| 6074514 | High selectivity etch using an external plasma discharge | Claes Bjorkman, Michael Welch | 2000-06-13 |
| 6022446 | Shallow magnetic fields for generating circulating electrons to enhance plasma processing | Bryan Pu, Ji Ding, Michael Welch | 2000-02-08 |
| 5989349 | Diagnostic pedestal assembly for a semiconductor wafer processing system | Kuang-Han Ke, Roger Alan Lindley, Richard R. Mett | 1999-11-23 |
| 5948168 | Distributed microwave plasma reactor for semiconductor processing | Harald Herchen, Michael Welch | 1999-09-07 |
| 5865937 | Broad-band adjustable power ratio phase-inverting plasma reactor | Hiroji Hanawa, Robert Wu, Michael Welch | 1999-02-02 |