Issued Patents All Time
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5843847 | Method for etching dielectric layers with high selectivity and low microloading | Bryan Pu, Michael Welch | 1998-12-01 |
| 5814563 | Method for etching dielectric using fluorohydrocarbon gas, NH.sub.3 -generating gas, and carbon-oxygen gas | Ji Ding, Michael Welch | 1998-09-29 |
| 5740009 | Apparatus for improving wafer and chuck edge protection | Bryan Pu, Kuang-Han Ke, Michael Welch, Semyon Sherstinsky, Alfred Mak +4 more | 1998-04-14 |
| 5702530 | Distributed microwave plasma reactor for semiconductor processing | Harald Herchen, Michael Welch | 1997-12-30 |
| 5683517 | Plasma reactor with programmable reactant gas distribution | — | 1997-11-04 |
| 5674321 | Method and apparatus for producing plasma uniformity in a magnetic field-enhanced plasma reactor | Bryan Pu | 1997-10-07 |
| 5605637 | Adjustable dc bias control in a plasma reactor | Evans Lee, Robert Wu | 1997-02-25 |
| 5585012 | Self-cleaning polymer-free top electrode for parallel electrode etch operation | Robert Wu, Hyman J. Levinstein | 1996-12-17 |
| 5514247 | Process for plasma etching of vias | Robert Wu | 1996-05-07 |