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Electrostatic chuck assembly having a dielectric filler |
Kartik Ramaswamy, Anwar Husain, Haitao Wang, Jaeyong Cho, Hamid Noorbakhsh +3 more |
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Electrostatic chuck assembly having a dielectric filler |
Kartik Ramaswamy, Anwar Husain, Haitao Wang, Jaeyong Cho, Hamid Noorbakhsh +3 more |
2019-12-10 |
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Methods for processing substrates in process systems having shared resources |
James P. Cruse, Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz +3 more |
2014-05-13 |
| 8496756 |
Methods for processing substrates in process systems having shared resources |
James P. Cruse, Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz +3 more |
2013-07-30 |
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Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor |
Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Panyin Hughes +4 more |
2008-05-20 |
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Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber |
Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Qi Li +3 more |
2008-01-08 |
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Magnet assembly for plasma containment |
Anthony Vesci, Vince Kirchhoff, James Woodward, Kevin Hughes, Mark van der Pyl +1 more |
2007-11-13 |
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Double slit-valve doors for plasma processing |
Michael Welch, Homgqing Shan, Paul Luscher, James D. Carducci, Siamak Salimian |
2006-12-12 |
| 6916399 |
Temperature controlled window with a fluid supply system |
Yan Rozenzon, Gil Lavi, Dong Ho Choi, Matt Hamrah, Paul Luscher +3 more |
2005-07-12 |
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Magnetic barrier for plasma in chamber exhaust |
James D. Carducci, Hamid Noorbakhsh, Hongqing Shan, Siamak Salimian, Paul Luscher +1 more |
2005-03-08 |
| 6797639 |
Dielectric etch chamber with expanded process window |
James D. Carducci, Hamid Noorbakhsh, Bryan Pu, Hongching Shan, Claes Bjorkman +3 more |
2004-09-28 |
| 6773544 |
Magnetic barrier for plasma in chamber exhaust |
James D. Carducci, Hamid Noorbakhsh, Hongqing Shan, Siamak Salimian, Paul Luscher +1 more |
2004-08-10 |
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Dielectric etch chamber with expanded process window |
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2004-04-06 |
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Double slit-valve doors for plasma processing |
Michael Welch, Homgqing Shan, Paul Luscher, James D. Carducci, Siamak Salimian |
2003-11-18 |
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Adjusting DC bias voltage in plasma chamber |
Hongching Shan, Michael Welch, Robert Wu, Bryan Pu, Paul Luscher +2 more |
2003-02-04 |
| 6432259 |
Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates |
Hamid Noorbakhsh, Michael Welch, Siamak Salimian, Paul Luscher, Hongching Shan +2 more |
2002-08-13 |
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Support assembly with thermal expansion compensation |
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2002-04-02 |
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Adjusting DC bias voltage in plasma chamber |
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2001-04-24 |
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Double slit-valve doors for plasma processing |
Michael Welch, Homgqing Shan, Paul Luscher, James D. Carducci, Siamak Salimian |
2001-02-27 |
| 6076482 |
Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion |
Ji Ding, James D. Carducci, Hongching Shan, Siamak Salimian, Paul Luscher +1 more |
2000-06-20 |
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Adjusting DC bias voltage in plasma chambers |
Hong Ching Shan, Michael Welch, Robert Wu, Bryan Pu, Paul Luscher +2 more |
1999-04-06 |
| 5605637 |
Adjustable dc bias control in a plasma reactor |
Hongching Shan, Robert Wu |
1997-02-25 |
