Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10930540 | Electrostatic chuck assembly having a dielectric filler | Kartik Ramaswamy, Anwar Husain, Haitao Wang, Jaeyong Cho, Hamid Noorbakhsh +3 more | 2021-02-23 |
| 10504765 | Electrostatic chuck assembly having a dielectric filler | Kartik Ramaswamy, Anwar Husain, Haitao Wang, Jaeyong Cho, Hamid Noorbakhsh +3 more | 2019-12-10 |
| 8721798 | Methods for processing substrates in process systems having shared resources | James P. Cruse, Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz +3 more | 2014-05-13 |
| 8496756 | Methods for processing substrates in process systems having shared resources | James P. Cruse, Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz +3 more | 2013-07-30 |
| 7374636 | Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor | Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Panyin Hughes +4 more | 2008-05-20 |
| 7316199 | Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber | Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Qi Li +3 more | 2008-01-08 |
| 7294224 | Magnet assembly for plasma containment | Anthony Vesci, Vince Kirchhoff, James Woodward, Kevin Hughes, Mark van der Pyl +1 more | 2007-11-13 |
| 7147719 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Paul Luscher, James D. Carducci, Siamak Salimian | 2006-12-12 |
| 6916399 | Temperature controlled window with a fluid supply system | Yan Rozenzon, Gil Lavi, Dong Ho Choi, Matt Hamrah, Paul Luscher +3 more | 2005-07-12 |
| 6863835 | Magnetic barrier for plasma in chamber exhaust | James D. Carducci, Hamid Noorbakhsh, Hongqing Shan, Siamak Salimian, Paul Luscher +1 more | 2005-03-08 |
| 6797639 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Bryan Pu, Hongching Shan, Claes Bjorkman +3 more | 2004-09-28 |
| 6773544 | Magnetic barrier for plasma in chamber exhaust | James D. Carducci, Hamid Noorbakhsh, Hongqing Shan, Siamak Salimian, Paul Luscher +1 more | 2004-08-10 |
| 6716302 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Bryan Pu, Hongching Shan, Claes Bjorkman +3 more | 2004-04-06 |
| 6647918 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Paul Luscher, James D. Carducci, Siamak Salimian | 2003-11-18 |
| 6513452 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Michael Welch, Robert Wu, Bryan Pu, Paul Luscher +2 more | 2003-02-04 |
| 6432259 | Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates | Hamid Noorbakhsh, Michael Welch, Siamak Salimian, Paul Luscher, Hongching Shan +2 more | 2002-08-13 |
| 6364957 | Support assembly with thermal expansion compensation | Gerhard Schneider, Hamid Noorbakhsh, Bryan Pu, Kaushik Vaidya, Brad L. Mays +2 more | 2002-04-02 |
| 6221782 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Michael Welch, Robert Wu, Bryan Pu, Paul Luscher +2 more | 2001-04-24 |
| 6192827 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Paul Luscher, James D. Carducci, Siamak Salimian | 2001-02-27 |
| 6076482 | Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion | Ji Ding, James D. Carducci, Hongching Shan, Siamak Salimian, Paul Luscher +1 more | 2000-06-20 |
| 5891350 | Adjusting DC bias voltage in plasma chambers | Hong Ching Shan, Michael Welch, Robert Wu, Bryan Pu, Paul Luscher +2 more | 1999-04-06 |
| 5605637 | Adjustable dc bias control in a plasma reactor | Hongching Shan, Robert Wu | 1997-02-25 |