Issued Patents All Time
Showing 25 most recent of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7147719 | Double slit-valve doors for plasma processing | Homgqing Shan, Paul Luscher, Evans Lee, James D. Carducci, Siamak Salimian | 2006-12-12 |
| 7115523 | Method and apparatus for etching photomasks | Brigitte Stoehr, Melisa Buie | 2006-10-03 |
| 6899111 | Configurable single substrate wet-dry integrated cluster cleaner | Paul Luscher, James D. Carducci, Siamak Salimian | 2005-05-31 |
| 6863835 | Magnetic barrier for plasma in chamber exhaust | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Siamak Salimian +1 more | 2005-03-08 |
| 6822185 | Temperature controlled dome-coil system for high power inductively coupled plasma systems | Paul Luscher, Siamak Salimian, Rolf Guenther, Zhong Qiang Hua, Son M. Phi +1 more | 2004-11-23 |
| 6813534 | Endpoint detection in substrate fabrication processes | Zhifeng Sui, Paul Luscher, Nils Johansson | 2004-11-02 |
| 6797639 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan +3 more | 2004-09-28 |
| 6773544 | Magnetic barrier for plasma in chamber exhaust | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Siamak Salimian +1 more | 2004-08-10 |
| 6774806 | Monitoring an element of a plant | John L. K. Bannell, David Mark Falconer, Thomas Simon Colaco Osorio | 2004-08-10 |
| 6716302 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan +3 more | 2004-04-06 |
| 6689249 | Shield or ring surrounding semiconductor workpiece in plasma chamber | Kuang-Han Ke, Bryan Pu, Hongching Shan, James C. Wang, Henry Fong +1 more | 2004-02-10 |
| 6647918 | Double slit-valve doors for plasma processing | Homgqing Shan, Paul Luscher, Evans Lee, James D. Carducci, Siamak Salimian | 2003-11-18 |
| 6592673 | Apparatus and method for detecting a presence or position of a substrate | Harald Herchen | 2003-07-15 |
| 6534417 | Method and apparatus for etching photomasks | Brigitte Stoehr | 2003-03-18 |
| 6513452 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Robert Wu, Bryan Pu, Paul Luscher +2 more | 2003-02-04 |
| 6432259 | Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates | Hamid Noorbakhsh, Siamak Salimian, Paul Luscher, Hongching Shan, Kaushik Vaidya +2 more | 2002-08-13 |
| 6391790 | Method and apparatus for etching photomasks | Brigitte Stoehr | 2002-05-21 |
| 6387288 | High selectivity etch using an external plasma discharge | Claes Bjorkman, Hongching Shan | 2002-05-14 |
| 6284093 | Shield or ring surrounding semiconductor workpiece in plasma chamber | Kuang-Han Ke, Bryan Pu, Hongching Shan, James C. Wang, Henry Fong +1 more | 2001-09-04 |
| 6267549 | Dual independent robot blades with minimal offset | William R. Brown | 2001-07-31 |
| 6248206 | Apparatus for sidewall profile control during an etch process | Harald Herchen, William R. Brown, Walter R. Merry | 2001-06-19 |
| 6232236 | Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system | Hongqing Shan, Claes Bjorkman, Paul Luscher, Richard R. Mett | 2001-05-15 |
| 6221782 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Robert Wu, Bryan Pu, Paul Luscher +2 more | 2001-04-24 |
| 6192827 | Double slit-valve doors for plasma processing | Homgqing Shan, Paul Luscher, Evans Lee, James D. Carducci, Siamak Salimian | 2001-02-27 |
| 6113731 | Magnetically-enhanced plasma chamber with non-uniform magnetic field | Hongching Shan, Roger Alan Lindley, Claes Bjorkman, Xue-Yu Qian, Richard W. Plavidal +4 more | 2000-09-05 |