| 7147719 |
Double slit-valve doors for plasma processing |
Homgqing Shan, Paul Luscher, Evans Lee, James D. Carducci, Siamak Salimian |
2006-12-12 |
$23,524,000 |
| 7115523 |
Method and apparatus for etching photomasks |
Brigitte Stoehr, Melisa Buie |
2006-10-03 |
$12,847,000 |
| 6899111 |
Configurable single substrate wet-dry integrated cluster cleaner |
Paul Luscher, James D. Carducci, Siamak Salimian |
2005-05-31 |
$12,544,000 |
| 6863835 |
Magnetic barrier for plasma in chamber exhaust |
James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Siamak Salimian +1 more |
2005-03-08 |
|
| 6822185 |
Temperature controlled dome-coil system for high power inductively coupled plasma systems |
Paul Luscher, Siamak Salimian, Rolf Guenther, Zhong Qiang Hua, Son M. Phi +1 more |
2004-11-23 |
$17,815,000 |
| 6813534 |
Endpoint detection in substrate fabrication processes |
Zhifeng Sui, Paul Luscher, Nils Johansson |
2004-11-02 |
|
| 6797639 |
Dielectric etch chamber with expanded process window |
James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan +3 more |
2004-09-28 |
$20,273,000 |
| 6773544 |
Magnetic barrier for plasma in chamber exhaust |
James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Siamak Salimian +1 more |
2004-08-10 |
|
| 6774806 |
Monitoring an element of a plant |
John L. K. Bannell, David Mark Falconer, Thomas Simon Colaco Osorio |
2004-08-10 |
|
| 6716302 |
Dielectric etch chamber with expanded process window |
James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan +3 more |
2004-04-06 |
$31,300,000 |
| 6689249 |
Shield or ring surrounding semiconductor workpiece in plasma chamber |
Kuang-Han Ke, Bryan Pu, Hongching Shan, James C. Wang, Henry Fong +1 more |
2004-02-10 |
$27,822,000 |
| 6647918 |
Double slit-valve doors for plasma processing |
Homgqing Shan, Paul Luscher, Evans Lee, James D. Carducci, Siamak Salimian |
2003-11-18 |
$51,686,000 |
| 6592673 |
Apparatus and method for detecting a presence or position of a substrate |
Harald Herchen |
2003-07-15 |
$26,921,000 |
| 6534417 |
Method and apparatus for etching photomasks |
Brigitte Stoehr |
2003-03-18 |
$24,651,000 |
| 6513452 |
Adjusting DC bias voltage in plasma chamber |
Hongching Shan, Evans Lee, Robert Wu, Bryan Pu, Paul Luscher +2 more |
2003-02-04 |
$18,252,000 |
| 6432259 |
Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates |
Hamid Noorbakhsh, Siamak Salimian, Paul Luscher, Hongching Shan, Kaushik Vaidya +2 more |
2002-08-13 |
$22,156,000 |
| 6391790 |
Method and apparatus for etching photomasks |
Brigitte Stoehr |
2002-05-21 |
$35,703,000 |
| 6387288 |
High selectivity etch using an external plasma discharge |
Claes Bjorkman, Hongching Shan |
2002-05-14 |
$48,008,000 |
| 6284093 |
Shield or ring surrounding semiconductor workpiece in plasma chamber |
Kuang-Han Ke, Bryan Pu, Hongching Shan, James C. Wang, Henry Fong +1 more |
2001-09-04 |
$82,822,000 |
| 6267549 |
Dual independent robot blades with minimal offset |
William R. Brown |
2001-07-31 |
$84,886,000 |
| 6248206 |
Apparatus for sidewall profile control during an etch process |
Harald Herchen, William R. Brown, Walter R. Merry |
2001-06-19 |
$110,909,000 |
| 6232236 |
Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system |
Hongqing Shan, Claes Bjorkman, Paul Luscher, Richard R. Mett |
2001-05-15 |
$105,754,000 |
| 6221782 |
Adjusting DC bias voltage in plasma chamber |
Hongching Shan, Evans Lee, Robert Wu, Bryan Pu, Paul Luscher +2 more |
2001-04-24 |
$56,824,000 |
| 6192827 |
Double slit-valve doors for plasma processing |
Homgqing Shan, Paul Luscher, Evans Lee, James D. Carducci, Siamak Salimian |
2001-02-27 |
$52,416,000 |
| 6113731 |
Magnetically-enhanced plasma chamber with non-uniform magnetic field |
Hongching Shan, Roger Alan Lindley, Claes Bjorkman, Xue-Yu Qian, Richard W. Plavidal +4 more |
2000-09-05 |
$156,933,000 |
