Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6074514 | High selectivity etch using an external plasma discharge | Claes Bjorkman, Hongching Shan | 2000-06-13 |
| 6062237 | Polymer removal from top surfaces and sidewalls of a semiconductor wafer | William R. Brown, Harald Herchen, Walter R. Merry | 2000-05-16 |
| 6022446 | Shallow magnetic fields for generating circulating electrons to enhance plasma processing | Hongching Shan, Bryan Pu, Ji Ding | 2000-02-08 |
| 6015761 | Microwave-activated etching of dielectric layers | Walter R. Merry, William R. Brown, Harald Herchen | 2000-01-18 |
| 5948168 | Distributed microwave plasma reactor for semiconductor processing | Hongching Shan, Harald Herchen | 1999-09-07 |
| 5891350 | Adjusting DC bias voltage in plasma chambers | Hong Ching Shan, Evans Lee, Robert Wu, Bryan Pu, Paul Luscher +2 more | 1999-04-06 |
| 5865937 | Broad-band adjustable power ratio phase-inverting plasma reactor | Hongching Shan, Hiroji Hanawa, Robert Wu | 1999-02-02 |
| 5843847 | Method for etching dielectric layers with high selectivity and low microloading | Bryan Pu, Hongching Shan | 1998-12-01 |
| 5814563 | Method for etching dielectric using fluorohydrocarbon gas, NH.sub.3 -generating gas, and carbon-oxygen gas | Ji Ding, Hongching Shan | 1998-09-29 |
| 5780359 | Polymer removal from top surfaces and sidewalls of a semiconductor wafer | William R. Brown, Harald Herchen, Walter R. Merry | 1998-07-14 |
| 5740009 | Apparatus for improving wafer and chuck edge protection | Bryan Pu, Hongching Shan, Kuang-Han Ke, Semyon Sherstinsky, Alfred Mak +4 more | 1998-04-14 |
| 5702530 | Distributed microwave plasma reactor for semiconductor processing | Hongching Shan, Harald Herchen | 1997-12-30 |
| 5400651 | Apparatus for interface measurement in a storage tank | — | 1995-03-28 |