Issued Patents All Time
Showing 25 most recent of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7147719 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Evans Lee, James D. Carducci, Siamak Salimian | 2006-12-12 |
| 6916399 | Temperature controlled window with a fluid supply system | Yan Rozenzon, Gil Lavi, Evans Lee, Dong Ho Choi, Matt Hamrah +3 more | 2005-07-12 |
| 6899111 | Configurable single substrate wet-dry integrated cluster cleaner | James D. Carducci, Siamak Salimian, Michael Welch | 2005-05-31 |
| 6863835 | Magnetic barrier for plasma in chamber exhaust | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Siamak Salimian +1 more | 2005-03-08 |
| 6822185 | Temperature controlled dome-coil system for high power inductively coupled plasma systems | Michael Welch, Siamak Salimian, Rolf Guenther, Zhong Qiang Hua, Son M. Phi +1 more | 2004-11-23 |
| 6813534 | Endpoint detection in substrate fabrication processes | Zhifeng Sui, Nils Johansson, Michael Welch | 2004-11-02 |
| 6797639 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan +3 more | 2004-09-28 |
| 6773544 | Magnetic barrier for plasma in chamber exhaust | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Siamak Salimian +1 more | 2004-08-10 |
| 6716302 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan +3 more | 2004-04-06 |
| 6647918 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Evans Lee, James D. Carducci, Siamak Salimian | 2003-11-18 |
| 6589361 | Configurable single substrate wet-dry integrated cluster cleaner | James D. Carducci, Siamak Salimian | 2003-07-08 |
| 6575622 | Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe | Hamid Norrbakhsh, Mike Welch, Siamak Salimian, Brad L. Mays | 2003-06-10 |
| 6535779 | Apparatus and method for endpoint control and plasma monitoring | Manush Birang, Gregory L. Kolte, Terry Doyle, Nils Johansson, Leonid Poslavsky | 2003-03-18 |
| 6513452 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Michael Welch, Robert Wu, Bryan Pu +2 more | 2003-02-04 |
| 6481886 | Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system | Kadthala Ramaya Narendrnath, Liang Wang, Shamouil Shamouilian, Hamid Noorbakhsh | 2002-11-19 |
| 6432259 | Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates | Hamid Noorbakhsh, Michael Welch, Siamak Salimian, Hongching Shan, Kaushik Vaidya +2 more | 2002-08-13 |
| 6353210 | Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using and in-situ wafer temperature optical probe | Hamid Norrbakhsh, Mike Welch, Siamak Salimian, Brad L. Mays | 2002-03-05 |
| 6232236 | Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system | Hongqing Shan, Claes Bjorkman, Richard R. Mett, Michael Welch | 2001-05-15 |
| 6221782 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Michael Welch, Robert Wu, Bryan Pu +2 more | 2001-04-24 |
| 6192827 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Evans Lee, James D. Carducci, Siamak Salimian | 2001-02-27 |
| 6076482 | Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion | Ji Ding, James D. Carducci, Hongching Shan, Siamak Salimian, Evans Lee +1 more | 2000-06-20 |
| 5995235 | Bandpass photon detector | Zhifeng Sui | 1999-11-30 |
| 5891350 | Adjusting DC bias voltage in plasma chambers | Hong Ching Shan, Evans Lee, Michael Welch, Robert Wu, Bryan Pu +2 more | 1999-04-06 |
| 5737177 | Apparatus and method for actively controlling the DC potential of a cathode pedestal | Richard R. Mett, Mahmoud Dahimene, Siamak Salimian, Mark Contreras | 1998-04-07 |
| 5253266 | MBE effusion source with asymmetrical heaters | Walter S. Knodle, III, Barry K. Caffee | 1993-10-12 |