Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10570815 | Wastegate valve assembly with biasing members | John Gong, Henry Guo, Xiaolei Jin, Xinlei QIU | 2020-02-25 |
| 8133819 | Plasma etching carbonaceous layers with sulfur-based etchants | Shawming Ma, Chang-Lin Hsieh, Bryan Liao, Jie Zhou, Hun Sang Kim | 2012-03-13 |
| 7838432 | Etch process with controlled critical dimension shrink | Shin-Li Sung, Shawming Ma | 2010-11-23 |
| 7807064 | Halogen-free amorphous carbon mask etch having high selectivity to photoresist | Jong Mun Kim, Ajey M. Joshi, Jingbao Liu, Bryan Pu | 2010-10-05 |
| 7510976 | Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity | Shing-Li Sung, Wonseok Lee, Shawming Ma | 2009-03-31 |
| 7432210 | Process to open carbon based hardmask | Shing-Li Sung, Shawming Ma, Bryan Pu | 2008-10-07 |
| 6403491 | Etch method using a dielectric etch chamber with expanded process window | Jingbao Liu, Takehiko Komatsu, Bryan Pu, Kenny L. Doan, Claes Bjorkman +4 more | 2002-06-11 |