CH

Chang-Lin Hsieh

Applied Materials: 11 patents #1,198 of 7,310Top 20%
AR Artilux: 2 patents #29 of 45Top 65%
AC Asustek Computer: 1 patents #655 of 1,430Top 50%
CO Coretronic: 1 patents #418 of 684Top 65%
📍 Sunnyvale, CA: #1,569 of 14,302 inventorsTop 15%
🗺 California: #35,036 of 386,348 inventorsTop 10%
Overall (All Time): #271,187 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
11500279 Optical module and projection apparatus Chien-Sheng Liu, Yu-Hao Chang, Yi Chang, Shu-Yu Lin 2022-11-15
11240554 HDMI apparatus using optical communication Shao-Hung Lin, Che-Fu Liang 2022-02-01
11039202 HDMI apparatus using optical communication Shao-Hung Lin, Che-Fu Liang 2021-06-15
10630101 Charging-discharging module of energy storage unit and charging-discharging method thereof Yi-Ming Huang, Chien-Chung Lo, Wei-Chen Tu 2020-04-21
8133819 Plasma etching carbonaceous layers with sulfur-based etchants Judy Wang, Shawming Ma, Bryan Liao, Jie Zhou, Hun Sang Kim 2012-03-13
7585778 Method of etching an organic low-k dielectric material Binxi Gu 2009-09-08
7244313 Plasma etch and photoresist strip process with intervening chamber de-fluorination and wafer de-fluorination steps Yifeng Zhou, Gerardo Delgadino 2007-07-17
7071112 BARC shaping for improved fabrication of dual damascene integrated circuit features Qiqun Zhang, Jie Yuan, Terry Leung, Silvia Halim 2006-07-04
6949203 System level in-situ integrated dielectric etch process particularly useful for copper dual damascene Diana Xiaobing Ma, Brian Sy-Yuan Shieh, Gerald Yin, Jennifer Y. Sun, Senh Thach +2 more 2005-09-27
6905968 Process for selectively etching dielectric layers Jie Yuan, Hui Chen, Theodoros Panagopoulos, Yan Ye 2005-06-14
6897154 Selective etching of low-k dielectrics Terry Leung, Qiqun Zheng, Yan Ye, Takehiko Komatsu 2005-05-24
6762127 Etch process for dielectric materials comprising oxidized organo silane materials Yves Pierre Boiteux, Hui Chen, Ivano Gregoratto, Hoiman Hung, Sum-Yee Betty Tang 2004-07-13
6607675 Method of etching carbon-containing silicon oxide films Hui Chen, Jie Yuan, Yan Ye 2003-08-19
6559942 Monitoring substrate processing with optical emission and polarized reflected radiation Zhifeng Sui, Coriolan Frum, Jie Yuan 2003-05-06
6547978 Method of heating a semiconductor substrate Yan Ye, Allen Zhao, Xiancan Deng, Diana Xiaobing Ma 2003-04-15
6455431 NH3 plasma descumming and resist stripping in semiconductor applications Hui Chen, Jie Yuan, Yan Ye 2002-09-24
6153530 Post-etch treatment of plasma-etched feature surfaces to prevent corrosion Yan Ye, Xiaoye Zhao, Xian-Can Deng, Wen-Chiang Tu, Chung-Fu Chu +1 more 2000-11-28