| 6921727 |
Method for modifying dielectric characteristics of dielectric layers |
Kang-Lie Chiang, Mahmoud Dahimene, Xiaoye Zhao, Yan Ye, Gerardo Delgadino +2 more |
2005-07-26 |
| 6849193 |
Highly selective process for etching oxide over nitride using hexafluorobutadiene |
Joseph P. Caulfield, Hongqing Shan, Ruiping Wang, Gerald Yin |
2005-02-01 |
| 6800213 |
Precision dielectric etch using hexafluorobutadiene |
Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Ruiping Wang +1 more |
2004-10-05 |
| 6797189 |
Enhancement of silicon oxide etch rate and nitride selectivity using hexafluorobutadiene or other heavy perfluorocarbon |
Joseph P. Caulfield, Hongqing Shan, Michael R. Rice, Kenneth S. Collins, Chunshi Cui |
2004-09-28 |
| 6762127 |
Etch process for dielectric materials comprising oxidized organo silane materials |
Yves Pierre Boiteux, Hui Chen, Ivano Gregoratto, Chang-Lin Hsieh, Sum-Yee Betty Tang |
2004-07-13 |
| 6602434 |
Process for etching oxide using hexafluorobutadiene or related fluorocarbons and manifesting a wide process window |
Joseph P. Caulfield, Hongqing Shan, Ruiping Wang, Gerald Yin |
2003-08-05 |
| 6544429 |
Enhancement of silicon oxide etch rate and substrate selectivity with xenon addition |
Joseph P. Caulfield, Hongchin Shan, Kenneth S. Collins, Chunshi Cui, Michael R. Rice |
2003-04-08 |
| 6432318 |
Dielectric etch process reducing striations and maintaining critical dimensions |
Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Ruiping Wang +1 more |
2002-08-13 |
| 6387287 |
Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window |
Joseph P. Caulfield, Hongqing Shan, Ruiping Wang, Gerald Yin |
2002-05-14 |
| 6380096 |
In-situ integrated oxide etch process particularly useful for copper dual damascene |
Joseph P. Caulfield, Sum-Yee Betty Tang, Jian Ding, Tianzong Xu |
2002-04-30 |
