Hoiman Hung — 10 Patents at Applied Materials

Hoiman Hung has been granted 10 US patents while listed as an inventor at Applied Materials. The first was granted in 2002 and the most recent in July 2005. Hoiman Hung ranks #481,000 of 4,157,543 US inventors in our database (top 11.6%). Patent records list Hoiman Hung in San Jose, CA, US.

Patents per Year

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Showing 1–10 of 10 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
6921727	Method for modifying dielectric characteristics of dielectric layers	Kang-Lie Chiang, Mahmoud Dahimene, Xiaoye Zhao, Yan Ye, Gerardo Delgadino +2 more	2005-07-26	$43,260,000
6849193	Highly selective process for etching oxide over nitride using hexafluorobutadiene	Joseph P. Caulfield, Hongqing Shan, Ruiping Wang, Gerald Yin	2005-02-01
6800213	Precision dielectric etch using hexafluorobutadiene	Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Ruiping Wang +1 more	2004-10-05
6797189	Enhancement of silicon oxide etch rate and nitride selectivity using hexafluorobutadiene or other heavy perfluorocarbon	Joseph P. Caulfield, Hongqing Shan, Michael R. Rice, Kenneth S. Collins, Chunshi Cui	2004-09-28
6762127	Etch process for dielectric materials comprising oxidized organo silane materials	Yves Pierre Boiteux, Hui Chen, Ivano Gregoratto, Chang-Lin Hsieh, Sum-Yee Betty Tang	2004-07-13
6602434	Process for etching oxide using hexafluorobutadiene or related fluorocarbons and manifesting a wide process window	Joseph P. Caulfield, Hongqing Shan, Ruiping Wang, Gerald Yin	2003-08-05	$36,159,000
6544429	Enhancement of silicon oxide etch rate and substrate selectivity with xenon addition	Joseph P. Caulfield, Hongchin Shan, Kenneth S. Collins, Chunshi Cui, Michael R. Rice	2003-04-08	$28,870,000
6432318	Dielectric etch process reducing striations and maintaining critical dimensions	Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Ruiping Wang +1 more	2002-08-13	$22,156,000
6387287	Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window	Joseph P. Caulfield, Hongqing Shan, Ruiping Wang, Gerald Yin	2002-05-14	$48,008,000
6380096	In-situ integrated oxide etch process particularly useful for copper dual damascene	Joseph P. Caulfield, Sum-Yee Betty Tang, Jian Ding, Tianzong Xu	2002-04-30	$26,677,000

Hoiman Hung — 10 Patents

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