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Enhancement of silicon oxide etch rate and nitride selectivity using hexafluorobutadiene or other heavy perfluorocarbon |
Hoiman Hung, Joseph P. Caulfield, Hongqing Shan, Michael R. Rice, Kenneth S. Collins |
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| 6667577 |
Plasma reactor with spoke antenna having a VHF mode with the spokes in phase |
Steven C. Shannon, Daniel J. Hoffman, Yan Ye, Gerardo Delgadino, Douglas A. Buchberger, Jr. +4 more |
2003-12-23 |
| 6652712 |
Inductive antenna for a plasma reactor producing reduced fluorine dissociation |
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2003-11-25 |
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Enhancement of silicon oxide etch rate and substrate selectivity with xenon addition |
Hoiman Hung, Joseph P. Caulfield, Hongchin Shan, Kenneth S. Collins, Michael R. Rice |
2003-04-08 |
| 6238588 |
High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process |
Kenneth S. Collins, David W. Groechel, Raymond Hung, Michael R. Rice, Gerald Yin +1 more |
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Silane etching process |
Robert Wu, Gerald Yin |
1999-10-12 |
