Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6797189 | Enhancement of silicon oxide etch rate and nitride selectivity using hexafluorobutadiene or other heavy perfluorocarbon | Hoiman Hung, Joseph P. Caulfield, Hongqing Shan, Michael R. Rice, Kenneth S. Collins | 2004-09-28 |
| 6667577 | Plasma reactor with spoke antenna having a VHF mode with the spokes in phase | Steven C. Shannon, Daniel J. Hoffman, Yan Ye, Gerardo Delgadino, Douglas A. Buchberger, Jr. +4 more | 2003-12-23 |
| 6652712 | Inductive antenna for a plasma reactor producing reduced fluorine dissociation | Shiang-Bau Wang, Daniel J. Hoffman, Yan Ye, Gerardo Delgadino, David Brian McParland +3 more | 2003-11-25 |
| 6544429 | Enhancement of silicon oxide etch rate and substrate selectivity with xenon addition | Hoiman Hung, Joseph P. Caulfield, Hongchin Shan, Kenneth S. Collins, Michael R. Rice | 2003-04-08 |
| 6238588 | High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process | Kenneth S. Collins, David W. Groechel, Raymond Hung, Michael R. Rice, Gerald Yin +1 more | 2001-05-29 |
| 5965463 | Silane etching process | Robert Wu, Gerald Yin | 1999-10-12 |