Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347695 | Methods for controlling contact resistance in cobalt-titanium structures | Takashi Kuratomi, Avgerinos V. Gelatos, Tae Hong Ha, Xuesong Lu, Szuheng Ho +3 more | 2025-07-01 |
| 11626288 | Integrated contact silicide with tunable work functions | Mehul Naik, Michael Haverty | 2023-04-11 |
| 11424132 | Methods and apparatus for controlling contact resistance in cobalt-titanium structures | Takashi Kuratomi, Avgerinos V. Gelatos, Tae Hong Ha, Xuesong Lu, Szuheng Ho +3 more | 2022-08-23 |
| 11417568 | Methods for selective deposition of tungsten atop a dielectric layer for bottom up gapfill | Wei Lei, Yi Xu, Yu Lei, Tae Hong Ha, Shirish A. PETHE | 2022-08-16 |
| 11355391 | Method for forming a metal gapfill | Xi Cen, Feiyue Ma, Kai Wu, Yu Lei, Kazuya Daito +13 more | 2022-06-07 |
| 11037838 | In-situ integrated chambers | Xuebin Li, Schubert S. Chu, Errol Antonio C. Sanchez, Patricia M. Liu, Gaurav Thareja | 2021-06-15 |
| 10615034 | Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel | Bo Zheng, Avgerinos V. Gelatos, Anshul Ashok Vyas | 2020-04-07 |
| 10586707 | Selective deposition of metal silicides | Namsung Kim, Srinivas D. Nemani, Ellie Yieh, Jong Hun Choi, Christopher Ahles +1 more | 2020-03-10 |
| 10475655 | Selective deposition of metal silicides | Namsung Kim, Srinivas D. Nemani, Ellie Yieh, Jong Hun Choi, Christopher Ahles +1 more | 2019-11-12 |
| 10163630 | Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high k at channel | Bo Zheng, Avgerinos V. Gelatos, Anshul Ashok Vyas | 2018-12-25 |
| 9960275 | Method of fabricating air-gap spacer for N7/N5 finFET and beyond | Chih-Yang Chang, Tatsuya Sato, Nam Sung Kim, Shiyu Sun, Bingxi Wood | 2018-05-01 |
| 9735009 | Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel | Bo Zheng, Avgerinos V. Gelatos, Anshul Ashok Vyas | 2017-08-15 |
| 8293460 | Double exposure patterning with carbonaceous hardmask | Hui-Wan Chen, Chorng-Ping Chang, Yongmei Chen, Huixiong Dai, Jiahua Yu +7 more | 2012-10-23 |
| 6623596 | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode | Kenneth S. Collins, Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Eric Askarinam +2 more | 2003-09-23 |
| 6613691 | Highly selective oxide etch process using hexafluorobutadiene | Joseph P. Caulfield, Hongching Shan, Ruiping Wang, Gerald Yin | 2003-09-02 |
| 6524432 | Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density | Kenneth S. Collins, Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Eric Askarinam +2 more | 2003-02-25 |
| 6440864 | Substrate cleaning process | Thomas J. Kropewnicki, Jeremiah T. Pender, Henry Fong, Charles Peter Auglis, Hongqing Shan | 2002-08-27 |
| 6329292 | Integrated self aligned contact etch | Joseph P. Caulfield, Jian Ding | 2001-12-11 |
| 6238588 | High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process | Kenneth S. Collins, David W. Groechel, Michael R. Rice, Gerald Yin, Jian Ding +1 more | 2001-05-29 |
| 6193836 | Center gas feed apparatus for a high density plasma reactor | Jon Mohn, Mei Chang, Kenneth S. Collins, Ru-Liang Lee | 2001-02-27 |
| 6174451 | Oxide etch process using hexafluorobutadiene and related unsaturated hydrofluorocarbons | Joseph P. Caulfield, Hongching Shan, Ruiping Wang, Gerald Yin | 2001-01-16 |
| 6077384 | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode | Kenneth S. Collins, Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Eric Askarinam +2 more | 2000-06-20 |
| 6054013 | Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density | Kenneth S. Collins, Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Eric Askarinam +2 more | 2000-04-25 |
| 6027606 | Center gas feed apparatus for a high density plasma reactor | John W. Mohn, Mei Chang, Kenneth S. Collins, Ru-Liang Lee | 2000-02-22 |
| 5965035 | Self aligned contact etch using difluoromethane and trifluoromethane | Jian Ding, Joseph P. Caulfield, Gerald Yin | 1999-10-12 |