| 6736931 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick |
2004-05-18 |
|
| 6634313 |
High-frequency electrostatically shielded toroidal plasma and radical source |
Hiroji Hanawa, Kenneth S. Collins, David Stover, Fernando Silveira |
2003-10-21 |
$27,123,000 |
| 6623596 |
Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Eric Askarinam, Joshua Chiu-Wing Tsui +2 more |
2003-09-23 |
$28,970,000 |
| 6545420 |
Plasma reactor using inductive RF coupling, and processes |
Kenneth S. Collins, Craig A. Roderick, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +6 more |
2003-04-08 |
$28,870,000 |
| 6524432 |
Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Eric Askarinam, Joshua Chiu-Wing Tsui +2 more |
2003-02-25 |
$21,067,000 |
| 6518195 |
Plasma reactor using inductive RF coupling, and processes |
Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more |
2003-02-11 |
$17,783,000 |
| 6488807 |
Magnetic confinement in a plasma reactor having an RF bias electrode |
Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more |
2002-12-03 |
$24,582,000 |
| 6454898 |
Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam +5 more |
2002-09-24 |
$13,765,000 |
| 6444085 |
Inductively coupled RF plasma reactor having an antenna adjacent a window electrode |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick |
2002-09-03 |
$21,151,000 |
| 6251792 |
Plasma etch processes |
Kenneth S. Collins, Craig A. Roderick, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +7 more |
2001-06-26 |
$57,772,000 |
| 6252354 |
RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control |
Kenneth S. Collins, Craig A. Roderick, Douglas A. Buchberger, Jr., Viktor Shel |
2001-06-26 |
$57,772,000 |
| 6165311 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick |
2000-12-26 |
$87,710,000 |
| 6077384 |
Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Eric Askarinam, Joshua Chiu-Wing Tsui +2 more |
2000-06-20 |
$109,669,000 |
| 6074512 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam +5 more |
2000-06-13 |
$124,024,000 |
| 6068784 |
Process used in an RF coupled plasma reactor |
Kenneth S. Collins, Craig A. Roderick, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +6 more |
2000-05-30 |
$186,360,000 |
| 6054013 |
Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Eric Askarinam, Joshua Chiu-Wing Tsui +2 more |
2000-04-25 |
$129,479,000 |
| 5824607 |
Plasma confinement for an inductively coupled plasma reactor |
Tetsuya Ishikawa |
1998-10-20 |
$37,932,000 |
| 5583737 |
Electrostatic chuck usable in high density plasma |
Kenneth S. Collins, Joshua Chiu-Wing Tsui, Craig A. Roderick, Nicolas Bright, Jeffrey Marks +2 more |
1996-12-10 |
$24,149,000 |
| 5574410 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits |
Kenneth S. Collins, Craig A. Roderick, Jay D. Pinson, II, Douglas A. Buchberger, Jr., Robert HARTLAGE +1 more |
1996-11-12 |
$24,715,000 |
| 5572170 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits |
Kenneth S. Collins, Craig A. Roderick, Jay D. Pinson, II, Douglas A. Buchberger, Jr., Robert HARTLAGE +1 more |
1996-11-05 |
$21,825,000 |
| 5556501 |
Silicon scavenger in an inductively coupled RF plasma reactor |
Kenneth S. Collins, Craig A. Roderick, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +7 more |
1996-09-17 |
$16,373,000 |
| 5539609 |
Electrostatic chuck usable in high density plasma |
Kenneth S. Collins, Joshua Chiu-Wing Tsui, Craig A. Roderick, Nicolas Bright, Jeffrey Marks +2 more |
1996-07-23 |
$14,059,000 |
| 5392018 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits |
Kenneth S. Collins, Craig A. Roderick, Jay D. Pinson, II, Douglas A. Buchberger, Jr., Robert HARTLAGE +1 more |
1995-02-21 |
$13,844,000 |
| 5350479 |
Electrostatic chuck for high power plasma processing |
Kenneth S. Collins, Joshua Chiu-Wing Tsui, Craig A. Roderick, Nicolas Bright, Jeffrey Marks +1 more |
1994-09-27 |
$23,197,000 |
| 5349313 |
Variable RF power splitter |
Kenneth S. Collins, Craig A. Roderick |
1994-09-20 |
$24,167,000 |
