Hidehiro Kojiri has been granted 10 US patents while listed as an inventor at Applied Materials . The first was granted in 2002 and the most recent in October 2021. Hidehiro Kojiri ranks #481,000 of 4,157,543 US inventors in our database (top 11.6%). Patent records list Hidehiro Kojiri in Sunnyvale, CA, US.
Patents per Year Patents granted per year, 2002 to 2021 Bar chart with a peak of 2 patents in 2014. peak 2 2002: 1 patents 2002 2004: 1 patents 2004 2012: 1 patents 2012 2013: 1 patents 2013 2014: 2 patents 2014 2015: 1 patents 2015 2016: 1 patents 2016 2020: 1 patents 2020 2021: 1 patents 2021
Issued Patents All Time
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Showing 1–10 of 10 patents
Patent # Title Co-Inventors Date Approx Value ⓘ
11145504 Method of forming film stacks with reduced defects Zhijun Jiang , Ganesh Balasubramanian , Arkajit Roy Barman , Xinhai Han , Deenesh Padhi +8 more 2021-10-12
$163,741,000
10755903 RPS defect reduction by cyclic clean induced RPS cooling Sidharth Bhatia , Zhili Zuo , Anjana M. Patel , Song-Moon Suh , Ganesh Balasubramanian 2020-08-25
$29,525,000
9431477 Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE) Olga Kryliouk , Yuriy Melnik , Tetsuya Ishikawa 2016-08-30
$23,980,000
8980002 Methods for improved growth of group III nitride semiconductor compounds Yuriy Melnik , Lu Chen 2015-03-17
$8,353,000
8853086 Methods for pretreatment of group III-nitride depositions Yuriy Melnik , Lu Chen 2014-10-07
$14,828,000
8778783 Methods for improved growth of group III nitride buffer layers Yuriy Melnik , Lu Chen 2014-07-15
$20,143,000
8507304 Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE) Olga Kryliouk , Yuriy Melnik , Tetsuya Ishikawa 2013-08-13
$15,679,000
8138069 Substrate pretreatment for subsequent high temperature group III depositions Yuriy Melnik , Olga Kryliouk , Tetsuya Ishikawa 2012-03-20
$11,903,000
6800213 Precision dielectric etch using hexafluorobutadiene Ji Ding , Yoshio Ishikawa , Keiji Horioka , Ruiping Wang , Robert Wu +1 more 2004-10-05
6432318 Dielectric etch process reducing striations and maintaining critical dimensions Ji Ding , Yoshio Ishikawa , Keiji Horioka , Ruiping Wang , Robert Wu +1 more 2002-08-13
$22,156,000
