AZ

Allen Zhao

Applied Materials: 18 patents #731 of 7,310Top 10%
Overall (All Time): #260,049 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
6825562 Damascene structure fabricated using a layer of silicon-based photoresist material Mehul Naik, Tim Weidman, Dian Sugiarto 2004-11-30
6547978 Method of heating a semiconductor substrate Yan Ye, Xiancan Deng, Diana Xiaobing Ma, Chang-Lin Hsieh 2003-04-15
6534416 Control of patterned etching in semiconductor features Yan Ye, Xiancan Deng, Diana Xiaobing Ma 2003-03-18
6514857 Damascene structure fabricated using a layer of silicon-based photoresist material Mehul Naik, Tim Weidman, Dian Sugiarto 2003-02-04
6489247 Copper etch using HCl and HBR chemistry Yan Ye, Xiancan Deng, Diana Xiaobing Ma 2002-12-03
6475335 RF plasma reactor with hybrid conductor and multi-radius dome ceiling Gerald Yin, Diana Xiabing Ma, Peter Loewenhardt, Philip M. Salzman, Hiroji Hanawa 2002-11-05
6458516 Method of etching dielectric layers using a removable hardmask Yan Ye, Pavel Ionov, Peter Hsieh, Diana Xiaobing Ma, Chun Yan +1 more 2002-10-01
6352081 Method of cleaning a semiconductor device processing chamber after a copper etch process Danny Lu, Peter Hsieh, Hong Shih, Li Xu, Yan Ye 2002-03-05
6331380 Method of pattern etching a low K dielectric layer Yan Ye, Pavel Ionov, Peter Hsieh, Diana Xiaobing Ma, Chun Yan +1 more 2001-12-18
6270617 RF plasma reactor with hybrid conductor and multi-radius dome ceiling Gerald Yin, Diana Xiabing Ma, Peter Loewenhardt, Philip M. Salzman, Hiroji Hanawa 2001-08-07
6248250 RF plasma reactor with hybrid conductor and multi-radius dome ceiling Hiroji Hanawa, Gerald Yin, Diana Xiaobing Ma, Philip M. Saizman, Peter Loewenhardt 2001-06-19
6204168 Damascene structure fabricated using a layer of silicon-based photoresist material Mehul Naik, Tim Weidman, Dian Sugiarto 2001-03-20
6143476 Method for high temperature etching of patterned layers using an organic mask stack Yan Ye, Peter Hsieh, Diana Xiaobing Ma 2000-11-07
6080529 Method of etching patterned layers useful as masking during subsequent etching or for damascene structures Yan Ye, Pavel Ionov, Peter Hsieh, Diana Xiaobing Ma, Chun Yan +1 more 2000-06-27
6008140 Copper etch using HCI and HBr chemistry Yan Ye, Xiancan Deng, Diana Xiaobing Ma 1999-12-28
5779926 Plasma process for etching multicomponent alloys Diana Xiaobing Ma, Daisuke Tajima, Peter Loewenhardt, Timothy Webb 1998-07-14
5777289 RF plasma reactor with hybrid conductor and multi-radius dome ceiling Hiroji Hanawa, Gerald Yin, Diana Xiaobing Ma, Philip M. Salzman, Peter Loewenhardt 1998-07-07
5753044 RF plasma reactor with hybrid conductor and multi-radius dome ceiling Hiroji Hanawa, Gerald Yin, Diana Xiabing Ma, Phil Salzman, Peter Loewenhardt 1998-05-19