Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10217627 | Methods of non-destructive post tungsten etch residue removal | Yi Zhou, Changhun Lee | 2019-02-26 |
| 8114525 | Process chamber component having electroplated yttrium containing coating | Nianci Han, Li Xu, Hong Shih, Yang Zhang, Jennifer Y. Sun | 2012-02-14 |
| 7833401 | Electroplating an yttrium-containing coating on a chamber component | Nianci Han, Li Xu, Hong Shih, Yang Zhang, Jennifer Y. Sun | 2010-11-16 |
| 7371467 | Process chamber component having electroplated yttrium containing coating | Nianci Han, Li Xu, Hong Shih, Yang Zhang, Jennifer Y. Sun | 2008-05-13 |
| 6641697 | Substrate processing using a member comprising an oxide of a group IIIB metal | Nianci Han, Hong Shih, Jie Yuan, Diana Xiaobing Ma | 2003-11-04 |
| 6413389 | Method for recovering metal from etch by-products | Hong Shih, Nianci Han, Li Xu, Diana Xiaobing Ma | 2002-07-02 |
| 6352081 | Method of cleaning a semiconductor device processing chamber after a copper etch process | Allen Zhao, Peter Hsieh, Hong Shih, Li Xu, Yan Ye | 2002-03-05 |
| 6352611 | Ceramic composition for an apparatus and method for processing a substrate | Nianci Han, Hong Shih, Jie Yuan, Diana Xiaobing Ma | 2002-03-05 |
| 6123791 | Ceramic composition for an apparatus and method for processing a substrate | Nianci Han, Hong Shih, Jie Yuan, Diana Xiaobing Ma | 2000-09-26 |
| 5756400 | Method and apparatus for cleaning by-products from plasma chamber surfaces | Yan Ye, Diana Xiaobing Ma, Gerald Yin, Keshav Prasad, Mark Siegel +3 more | 1998-05-26 |