Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8938362 | Systems, methods, and apparatus for doppler LIDAR | Steven M. Beck | 2015-01-20 |
| 7399707 | In situ application of etch back for improved deposition into high-aspect-ratio features | Padmanabhan Krishnaraj, Canfeng Lai, Michael S. Cox, Shamouil Shamouilian | 2008-07-15 |
| 6869880 | In situ application of etch back for improved deposition into high-aspect-ratio features | Padmanabhan Krishnaraj, Canfeng Lai, Michael S. Cox, Shamouil Shamouilian | 2005-03-22 |
| 6581612 | Chamber cleaning with fluorides of iodine | Peter Loewenhardt, Shamouil Shamouilian, Pamanabhan Krishnaraj | 2003-06-24 |
| 6537918 | Method for etching silicon oxynitride and dielectric antireflection coatings | Sung Ho Kim, Dean Li, Chun Yan, James C. Wang | 2003-03-25 |
| 6458516 | Method of etching dielectric layers using a removable hardmask | Yan Ye, Allen Zhao, Peter Hsieh, Diana Xiaobing Ma, Chun Yan +1 more | 2002-10-01 |
| 6331380 | Method of pattern etching a low K dielectric layer | Yan Ye, Allen Zhao, Peter Hsieh, Diana Xiaobing Ma, Chun Yan +1 more | 2001-12-18 |
| 6291356 | Method for etching silicon oxynitride and dielectric antireflection coatings | Sung Ho Kim, Dean Li, Chun Yan, James C. Wang | 2001-09-18 |
| 6080529 | Method of etching patterned layers useful as masking during subsequent etching or for damascene structures | Yan Ye, Allen Zhao, Peter Hsieh, Diana Xiaobing Ma, Chun Yan +1 more | 2000-06-27 |
| 6013582 | Method for etching silicon oxynitride and inorganic antireflection coatings | Sung Ho Kim, Dean Li | 2000-01-11 |
| 6010966 | Hydrocarbon gases for anisotropic etching of metal-containing layers | — | 2000-01-04 |