Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6689249 | Shield or ring surrounding semiconductor workpiece in plasma chamber | Kuang-Han Ke, Hongching Shan, James C. Wang, Henry Fong, Zongyu LI +1 more | 2004-02-10 |
| 6613689 | Magnetically enhanced plasma oxide etch using hexafluorobutadiene | Jingbao Liu, Takehiko Komatsu, Hongqing Shan, Keji Horioka | 2003-09-02 |
| 6568346 | Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply | Hongching Shan, Claes Bjorkman, Kenny L. Doan, Mike Welch, Richard R. Mett | 2003-05-27 |
| 6513452 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Michael Welch, Robert Wu, Paul Luscher +2 more | 2003-02-04 |
| 6451703 | Magnetically enhanced plasma etch process using a heavy fluorocarbon etching gas | Jingbao Liu, Takehiko Komatsu, Hongqing Shan, Keji Horioka | 2002-09-17 |
| 6403491 | Etch method using a dielectric etch chamber with expanded process window | Jingbao Liu, Judy Wang, Takehiko Komatsu, Kenny L. Doan, Claes Bjorkman +4 more | 2002-06-11 |
| 6364957 | Support assembly with thermal expansion compensation | Gerhard Schneider, Hamid Noorbakhsh, Kaushik Vaidya, Brad L. Mays, Hung Dao +2 more | 2002-04-02 |
| 6326307 | Plasma pretreatment of photoresist in an oxide etch process | Roger Alan Lindley, Henry Fong, Yunsang Kim, Takehito Komatsu, Ajey M. Joshi +1 more | 2001-12-04 |
| 6284093 | Shield or ring surrounding semiconductor workpiece in plasma chamber | Kuang-Han Ke, Hongching Shan, James C. Wang, Henry Fong, Zongyu LI +1 more | 2001-09-04 |
| 6273022 | Distributed inductively-coupled plasma source | Hongching Shan, Claes Bjorkman, Kenny L. Doan, Mike Welch, Richard R. Mett | 2001-08-14 |
| 6221782 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Michael Welch, Robert Wu, Paul Luscher +2 more | 2001-04-24 |
| 6113731 | Magnetically-enhanced plasma chamber with non-uniform magnetic field | Hongching Shan, Roger Alan Lindley, Claes Bjorkman, Xue-Yu Qian, Richard W. Plavidal +4 more | 2000-09-05 |
| 6022446 | Shallow magnetic fields for generating circulating electrons to enhance plasma processing | Hongching Shan, Ji Ding, Michael Welch | 2000-02-08 |
| 5891350 | Adjusting DC bias voltage in plasma chambers | Hong Ching Shan, Evans Lee, Michael Welch, Robert Wu, Paul Luscher +2 more | 1999-04-06 |
| 5843847 | Method for etching dielectric layers with high selectivity and low microloading | Hongching Shan, Michael Welch | 1998-12-01 |
| 5740009 | Apparatus for improving wafer and chuck edge protection | Hongching Shan, Kuang-Han Ke, Michael Welch, Semyon Sherstinsky, Alfred Mak +4 more | 1998-04-14 |
| 5674321 | Method and apparatus for producing plasma uniformity in a magnetic field-enhanced plasma reactor | Hongching Shan | 1997-10-07 |