HC

Heeyeop Chae

Applied Materials: 3 patents #2,994 of 7,310Top 45%
DC Dms Co.: 2 patents #13 of 68Top 20%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Seoul, CA: #313 of 604 inventorsTop 55%
Overall (All Time): #405,165 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12134821 Multilayer encapsulation thin-film Choelmin Jang, Sungmin Cho, Ho-Kyoon Chung, Sang-Joon Seo, Seung Woo Seo 2024-11-05
11098244 Composition comprising inorganic nano particle structure, light conversion thin film using the same, and display apparatus using the film Changmin Lee, Eunhee Nam, Hyungsuk MOON, Hyejin Kim 2021-08-24
10942450 Inorganic nanoparticle structure, film, optical member, light-emitting device, and liquid crystal display apparatus having the same Chang Min Lee, Hee Young Kim, Woo Suk Lee 2021-03-09
10899963 Light-emitting structure, optical member having the light-emitting structure, light-emitting device, and liquid crystal display apparatus Ho Seok Jin, Chang Min Lee, Bo Kyoung Kim 2021-01-26
9899619 Electroluminescent diode having delayed florescence quantum dot Jun-Yeob Lee, Namhun Kim, Sangkyu Jeon 2018-02-20
9196849 Polymer/inorganic multi-layer encapsulation film Dong Geun Jung, Min-woo Park, Hoon Kim, Chae Min LEE 2015-11-24
8236105 Apparatus for controlling gas flow in a semiconductor substrate processing chamber Kallol Bera, Hamid Tavassoli, Yan Ye 2012-08-07
8223329 Endpoint detection device for realizing real-time control of plasma reactor, plasma reactor with endpoint detection device, and endpoint detection method Kun Joo Park, Kwang Hoon Han, Kee Hyun Kim, Weon Mook Lee, Kyounghoon Han 2012-07-17
8049872 Endpoint detection device for realizing real-time control of plasma reactor, plasma reactor with endpoint detection device, and endpoint detection method Kun Joo Park, Kwang Hoon Han, Kee Hyun Kim, Weon Mook Lee, Kyounghoon Han 2011-11-01
7955986 Capacitively coupled plasma reactor with magnetic plasma control Daniel J. Hoffman, Matthew L. Miller, Jang-Gyoo Yang, Michael Barnes, Tetsuya Ishikawa +1 more 2011-06-07
7256134 Selective etching of carbon-doped low-k dielectrics Yunsang Kim, Neungho Shin, Joey Chiu, Yan Ye, Fang Tian +1 more 2007-08-14
6853141 Capacitively coupled plasma reactor with magnetic plasma control Daniel J. Hoffman, Matthew L. Miller, Jang-Gyoo Yang, Michael Barnes, Tetsuya Ishikawa +1 more 2005-02-08