Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12249484 | Methods and apparatus for controlling radio frequency electrode impedances in process chambers | Yi Yang, Chong Ma, Yuan Xue | 2025-03-11 |
| 11898249 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2024-02-13 |
| 11621152 | Methods and apparatus for processing a substrate using improved shield configurations | Soundarrajan JEMBULINGAM, Jeonghoon Oh | 2023-04-04 |
| 11613812 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2023-03-28 |
| 11508563 | Methods and apparatus for processing a substrate using improved shield configurations | Soundarrajan JEMBULINGAM, Jeonghoon Oh | 2022-11-22 |
| 11450511 | Methods and apparatus for zone control of RF bias for stress uniformity | Lizhong Sun, Yi Yang, Chong Ma, Xiaodong Yang | 2022-09-20 |
| 10950477 | Ceramic heater and esc with enhanced wafer edge performance | Xing Lin, Jianhua Zhou, Zheng John Ye, Juan Carlos Rocha-Alvarez | 2021-03-16 |
| 10910227 | Bottom and side plasma tuning having closed loop control | Juan Carlos Rocha-Alvarez, Amit Kumar BANSAL, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan +1 more | 2021-02-02 |
| 10793954 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2020-10-06 |
| 10580626 | Arcing detection apparatus for plasma processing | Lin Zhang, Rongping Wang, Michael S. Cox, Andrew V. LE | 2020-03-03 |
| 10450653 | High impedance RF filter for heater with impedance tuning device | Mohamad A. Ayoub, Juan Carlos Rocha-Alvarez, Zheng John Ye, Ramprakash Sankarakrishnan, Jianhua Zhou | 2019-10-22 |
| 10347465 | Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber | Mohamad A. Ayoub, Amit Kumar BANSAL | 2019-07-09 |
| 10125422 | High impedance RF filter for heater with impedance tuning device | Mohamad A. Ayoub, Juan Carlos Rocha-Alvarez, Zheng John Ye, Ramprakash Sankarakrishnan, Jianhua Zhou | 2018-11-13 |
| 10128118 | Bottom and side plasma tuning having closed loop control | Juan Carlos Rocha-Alvarez, Amit Kumar BANSAL, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan +1 more | 2018-11-13 |
| 10060032 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-08-28 |
| 10032608 | Apparatus and method for tuning electrode impedance for high frequency radio frequency and terminating low frequency radio frequency to ground | Juan Carlos Rocha-Alvarez, Mohamad A. Ayoub | 2018-07-24 |
| 10030306 | PECVD apparatus and process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-07-24 |
| 9865431 | Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber | Mohamad A. Ayoub, Amit Kumar BANSAL | 2018-01-09 |
| 9816187 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2017-11-14 |
| 9458537 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2016-10-04 |
| 9386680 | Detecting plasma arcs by monitoring RF reflected power in a plasma processing chamber | Shilpa Sudhakaran, Mohamad A. Ayoub | 2016-07-05 |
| 9157730 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2015-10-13 |
| 8587321 | System and method for current-based plasma excursion detection | Mohamad A. Ayoub | 2013-11-19 |
| 8502689 | System and method for voltage-based plasma excursion detection | Mohamad A. Ayoub | 2013-08-06 |
| 7096819 | Inductive plasma processor having coil with plural windings and method of controlling plasma density | Robert Veltrop, Thomas E. Wicker | 2006-08-29 |