Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11898249 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2024-02-13 |
| 11613812 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2023-03-28 |
| 11136665 | Shadow ring for modifying wafer edge and bevel deposition | Dale Du Bois, Robert W. Kim, Amit Kumar BANSAL, Mark Fodor, Binh Nguyen +6 more | 2021-10-05 |
| 10916407 | Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates | Abdul Aziz Khaja, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez | 2021-02-09 |
| 10910227 | Bottom and side plasma tuning having closed loop control | Juan Carlos Rocha-Alvarez, Amit Kumar BANSAL, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan +1 more | 2021-02-02 |
| 10793954 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2020-10-06 |
| 10774423 | Tunable ground planes in plasma chambers | Karthik Janakiraman, Thomas Nowak, Juan Carlos Rocha-Alvarez, Mark Fodor, Dale R. Du Bois +4 more | 2020-09-15 |
| 10450653 | High impedance RF filter for heater with impedance tuning device | Jian J. Chen, Juan Carlos Rocha-Alvarez, Zheng John Ye, Ramprakash Sankarakrishnan, Jianhua Zhou | 2019-10-22 |
| 10347465 | Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber | Jian J. Chen, Amit Kumar BANSAL | 2019-07-09 |
| 10227695 | Shadow ring for modifying wafer edge and bevel deposition | Dale R. Du Bois, Robert W. Kim, Amit Kumar BANSAL, Mark Fodor, Binh Nguyen +6 more | 2019-03-12 |
| 10192717 | Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates | Abdul Aziz Khaja, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez | 2019-01-29 |
| 10125422 | High impedance RF filter for heater with impedance tuning device | Jian J. Chen, Juan Carlos Rocha-Alvarez, Zheng John Ye, Ramprakash Sankarakrishnan, Jianhua Zhou | 2018-11-13 |
| 10128118 | Bottom and side plasma tuning having closed loop control | Juan Carlos Rocha-Alvarez, Amit Kumar BANSAL, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan +1 more | 2018-11-13 |
| 10083818 | Auto frequency tuned remote plasma source | Abdul Aziz Khaja, Ramesh Bokka, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez | 2018-09-25 |
| 10060032 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-08-28 |
| 10030306 | PECVD apparatus and process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-07-24 |
| 10032608 | Apparatus and method for tuning electrode impedance for high frequency radio frequency and terminating low frequency radio frequency to ground | Jian J. Chen, Juan Carlos Rocha-Alvarez | 2018-07-24 |
| 9865431 | Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber | Jian J. Chen, Amit Kumar BANSAL | 2018-01-09 |
| 9816187 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2017-11-14 |
| 9466469 | Remote plasma source for controlling plasma skew | Abdul Aziz Khaja, Ramesh Bokka, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez | 2016-10-11 |
| 9458537 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2016-10-04 |
| 9386680 | Detecting plasma arcs by monitoring RF reflected power in a plasma processing chamber | Jian J. Chen, Shilpa Sudhakaran | 2016-07-05 |
| 9337072 | Apparatus and method for substrate clamping in a plasma chamber | Ganesh Balasubramanian, Amit Kumar BANSAL, Eller Y. Juco, Hyung Joon Kim, Karthik Janakiraman +11 more | 2016-05-10 |
| 9157730 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2015-10-13 |
| 8884524 | Apparatus and methods for improving reliability of RF grounding | Jianhua Zhou, Dale R. Du Bois, Juan Carlos Rocha-Alvarez | 2014-11-11 |