| 11136665 |
Shadow ring for modifying wafer edge and bevel deposition |
Dale Du Bois, Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Binh Nguyen +6 more |
2021-10-05 |
$94,201,000 |
| 10774423 |
Tunable ground planes in plasma chambers |
Karthik Janakiraman, Thomas Nowak, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Amit Kumar BANSAL +4 more |
2020-09-15 |
$35,161,000 |
| 10227695 |
Shadow ring for modifying wafer edge and bevel deposition |
Dale R. Du Bois, Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Binh Nguyen +6 more |
2019-03-12 |
$40,470,000 |
| 8778813 |
Confined process volume PECVD chamber |
Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Jianhua Zhou +6 more |
2014-07-15 |
$20,143,000 |
| 8444926 |
Processing chamber with heated chamber liner |
Sophia M. Velastegui, Bok Hoen Kim, Dale R. DuBois |
2013-05-21 |
$14,657,000 |
| 8197636 |
Systems for plasma enhanced chemical vapor deposition and bevel edge etching |
Ashish Shah, Dale R. DuBois, Ganesh Balasubramanian, Eui Kyoon Kim, Chiu Chan +7 more |
2012-06-12 |
$16,616,000 |
| 7922440 |
Apparatus and method for centering a substrate in a process chamber |
Dale R. Du Bois, Ganesh Balasubramanian, Chiu Chan, Karthik Janakiraman |
2011-04-12 |
$6,345,000 |
| 7354288 |
Substrate support with clamping electrical connector |
Kazutoshi Maehara, Visweswaren Sivaramakrishnan, Kentaro WADA, Andrzei Kaszuba |
2008-04-08 |
$17,034,000 |
| 7024105 |
Substrate heater assembly |
Sophia M. Velastegui, Soovo Sen, Visweswaren Sivaramakrishnan, Peter Wai-Man Lee, Mario David Silvetti |
2006-04-04 |
$23,180,000 |
| 6689930 |
Method and apparatus for cleaning an exhaust line in a semiconductor processing system |
Ben Pang, David Cheung, William Taylor, Sebastion Raoux |
2004-02-10 |
$27,822,000 |
| 6680420 |
Apparatus for cleaning an exhaust line in a semiconductor processing system |
Ben Pang, David Cheung, William Taylor, Sebastien Raoux |
2004-01-20 |
$55,713,000 |
| 6517913 |
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
David Cheung, Sebastien Raoux, Judy H. Huang, William Taylor, Kevin Fairbairn |
2003-02-11 |
$17,783,000 |
| 6506994 |
Low profile thick film heaters in multi-slot bake chamber |
Yen-Kun Wang, Chen-An Chen, Himanshu Pokharna, Son T. Nguyen, Kelly Fong +1 more |
2003-01-14 |
$32,327,000 |
| 6358573 |
Mixed frequency CVD process |
Sebastien Raoux, Mandar Mudholkar, William Taylor, Judy H. Huang, David Silvetti +2 more |
2002-03-19 |
$47,426,000 |
| 6354241 |
Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing |
Tsutomu Tanaka, Chau Nguyen, Hari Ponnekanti, Kevin Fairbairn, Sebastien Raoux |
2002-03-12 |
$78,135,000 |
| 6193802 |
Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
Ben Pang, David Cheung, William Taylor, Sebastien Raoux |
2001-02-27 |
$52,416,000 |
| 6194628 |
Method and apparatus for cleaning a vacuum line in a CVD system |
Ben Pang, David Cheung, William Taylor, Sebastien Raoux |
2001-02-27 |
$52,416,000 |
| 6187072 |
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
David Cheung, Sebastien Raoux, Judy H. Huang, William Taylor, Kevin Fairbairn |
2001-02-13 |
$172,556,000 |
| 6098568 |
Mixed frequency CVD apparatus |
Sebastien Raoux, Mandar Mudholkar, William Taylor, Judy H. Huang, David Silvetti +2 more |
2000-08-08 |
$74,240,000 |
| 5959409 |
Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method protecting such heated metal surfaces |
Charles Dornfest, John M. White, Craig Bercaw, Hiroyuki Steven Tomosawa |
1999-09-28 |
$70,146,000 |
| 5817406 |
Ceramic susceptor with embedded metal electrode and brazing material connection |
David Cheung, Christopher T. Lane, Ryusuke Ushikoshi, Hideyoshi Tsuruta, Tomoyuki Fujii |
1998-10-06 |
$27,201,000 |
| 5705225 |
Method of filling pores in anodized aluminum parts |
Charles Dornfest, Fred C. Redeker, Craig Bercaw, H. Steven Tomozawa |
1998-01-06 |
$49,266,000 |
| 5680013 |
Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfaces |
Charles Dornfest, John M. White, Craig Bercaw, Hiroyuki Steven Tomosawa |
1997-10-21 |
$85,045,000 |
| 5633073 |
Ceramic susceptor with embedded metal electrode and eutectic connection |
David Cheung, Christopher T. Lane, Harold Mortensen |
1997-05-27 |
$150,118,000 |
| 5531835 |
Patterned susceptor to reduce electrostatic force in a CVD chamber |
Craig Bercaw, Charles Dornfest |
1996-07-02 |
$37,475,000 |
