Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11136665 | Shadow ring for modifying wafer edge and bevel deposition | Dale Du Bois, Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Binh Nguyen +6 more | 2021-10-05 |
| 10774423 | Tunable ground planes in plasma chambers | Karthik Janakiraman, Thomas Nowak, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Amit Kumar BANSAL +4 more | 2020-09-15 |
| 10227695 | Shadow ring for modifying wafer edge and bevel deposition | Dale R. Du Bois, Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Binh Nguyen +6 more | 2019-03-12 |
| 8778813 | Confined process volume PECVD chamber | Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Jianhua Zhou +6 more | 2014-07-15 |
| 8444926 | Processing chamber with heated chamber liner | Sophia M. Velastegui, Bok Hoen Kim, Dale R. DuBois | 2013-05-21 |
| 8197636 | Systems for plasma enhanced chemical vapor deposition and bevel edge etching | Ashish Shah, Dale R. DuBois, Ganesh Balasubramanian, Eui Kyoon Kim, Chiu Chan +7 more | 2012-06-12 |
| 7922440 | Apparatus and method for centering a substrate in a process chamber | Dale R. Du Bois, Ganesh Balasubramanian, Chiu Chan, Karthik Janakiraman | 2011-04-12 |
| 7354288 | Substrate support with clamping electrical connector | Kazutoshi Maehara, Visweswaren Sivaramakrishnan, Kentaro WADA, Andrzei Kaszuba | 2008-04-08 |
| 7024105 | Substrate heater assembly | Sophia M. Velastegui, Soovo Sen, Visweswaren Sivaramakrishnan, Peter Wai-Man Lee, Mario David Silvetti | 2006-04-04 |
| 6689930 | Method and apparatus for cleaning an exhaust line in a semiconductor processing system | Ben Pang, David Cheung, William Taylor, Sebastion Raoux | 2004-02-10 |
| 6680420 | Apparatus for cleaning an exhaust line in a semiconductor processing system | Ben Pang, David Cheung, William Taylor, Sebastien Raoux | 2004-01-20 |
| 6517913 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | David Cheung, Sebastien Raoux, Judy H. Huang, William Taylor, Kevin Fairbairn | 2003-02-11 |
| 6506994 | Low profile thick film heaters in multi-slot bake chamber | Yen-Kun Wang, Chen-An Chen, Himanshu Pokharna, Son T. Nguyen, Kelly Fong +1 more | 2003-01-14 |
| 6358573 | Mixed frequency CVD process | Sebastien Raoux, Mandar Mudholkar, William Taylor, Judy H. Huang, David Silvetti +2 more | 2002-03-19 |
| 6354241 | Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing | Tsutomu Tanaka, Chau Nguyen, Hari Ponnekanti, Kevin Fairbairn, Sebastien Raoux | 2002-03-12 |
| 6193802 | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment | Ben Pang, David Cheung, William Taylor, Sebastien Raoux | 2001-02-27 |
| 6194628 | Method and apparatus for cleaning a vacuum line in a CVD system | Ben Pang, David Cheung, William Taylor, Sebastien Raoux | 2001-02-27 |
| 6187072 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | David Cheung, Sebastien Raoux, Judy H. Huang, William Taylor, Kevin Fairbairn | 2001-02-13 |
| 6098568 | Mixed frequency CVD apparatus | Sebastien Raoux, Mandar Mudholkar, William Taylor, Judy H. Huang, David Silvetti +2 more | 2000-08-08 |
| 5959409 | Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method protecting such heated metal surfaces | Charles Dornfest, John M. White, Craig Bercaw, Hiroyuki Steven Tomosawa | 1999-09-28 |
| 5817406 | Ceramic susceptor with embedded metal electrode and brazing material connection | David Cheung, Christopher T. Lane, Ryusuke Ushikoshi, Hideyoshi Tsuruta, Tomoyuki Fujii | 1998-10-06 |
| 5705225 | Method of filling pores in anodized aluminum parts | Charles Dornfest, Fred C. Redeker, Craig Bercaw, H. Steven Tomozawa | 1998-01-06 |
| 5680013 | Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfaces | Charles Dornfest, John M. White, Craig Bercaw, Hiroyuki Steven Tomosawa | 1997-10-21 |
| 5633073 | Ceramic susceptor with embedded metal electrode and eutectic connection | David Cheung, Christopher T. Lane, Harold Mortensen | 1997-05-27 |
| 5531835 | Patterned susceptor to reduce electrostatic force in a CVD chamber | Craig Bercaw, Charles Dornfest | 1996-07-02 |