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Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections |
Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Ashish Shah, Inna Shmurun |
2013-12-03 |
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Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation |
Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more |
2012-06-19 |
| 7909595 |
Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections |
Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Ashish Shah, Inna Shmurun |
2011-03-22 |
| 7777198 |
Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation |
Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more |
2010-08-17 |
| 7692171 |
Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors |
Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Tom K. Cho, Hichem M'Saad, Scott A. Hendrickson +2 more |
2010-04-06 |
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Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors |
Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Ndanka O. Mukuti |
2009-09-15 |
| 7566891 |
Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors |
Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more |
2009-07-28 |
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Substrate support with clamping electrical connector |
Kazutoshi Maehara, Visweswaren Sivaramakrishnan, Kentaro WADA, Mark Fodor |
2008-04-08 |