| 11898249 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2024-02-13 |
$47,589,000 |
| 11613812 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2023-03-28 |
$69,791,000 |
| 11133210 |
Dual temperature heater |
Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap +1 more |
2021-09-28 |
$64,178,000 |
| 10793954 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2020-10-06 |
$62,697,000 |
| 10774423 |
Tunable ground planes in plasma chambers |
Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Mark Fodor, Dale R. Du Bois, Amit Kumar BANSAL +4 more |
2020-09-15 |
$35,161,000 |
| 10570517 |
Apparatus and method for UV treatment, chemical treatment, and deposition |
Amit Kumar BANSAL, Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Scott A. Hendrickson |
2020-02-25 |
$22,337,000 |
| 10522375 |
Monitoring system for deposition and method of operation thereof |
Edward W. Budiarto, Majeed A. Foad, Ralf Hofmann, Todd Egan, Mehdi Vaez-Iravani |
2019-12-31 |
$41,069,000 |
| 10325799 |
Dual temperature heater |
Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap +1 more |
2019-06-18 |
$21,126,000 |
| 10094486 |
Method and system for supplying a cleaning gas into a process chamber |
Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez +2 more |
2018-10-09 |
$16,738,000 |
| 10060032 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2018-08-28 |
$23,630,000 |
| 10030306 |
PECVD apparatus and process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2018-07-24 |
$37,876,000 |
| 9870935 |
Monitoring system for deposition and method of operation thereof |
Edward W. Budiarto, Majeed A. Foad, Ralf Hofmann, Todd Egan, Mehdi Vaez-Iravani |
2018-01-16 |
$25,242,000 |
| 9816187 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2017-11-14 |
$27,960,000 |
| 9506145 |
Method and hardware for cleaning UV chambers |
Sanjeev Baluja, Alexandros T. Demos, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson +6 more |
2016-11-29 |
$13,456,000 |
| 9458537 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2016-10-04 |
$14,162,000 |
| 9364871 |
Method and hardware for cleaning UV chambers |
Sanjeev Baluja, Alexandros T. Demos, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson +6 more |
2016-06-14 |
$14,652,000 |
| 9206511 |
Method and system for supplying a cleaning gas into a process chamber |
Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez +2 more |
2015-12-08 |
$11,073,000 |
| 9157730 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2015-10-13 |
$9,629,000 |
| 8911553 |
Quartz showerhead for nanocure UV chamber |
Sanjeev Baluja, Juan Carlos Rocha-Alvarez, Alexandros T. Demos, Jianhua Zhou |
2014-12-16 |
$14,131,000 |
| 8778813 |
Confined process volume PECVD chamber |
Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Mark Fodor +6 more |
2014-07-15 |
$20,143,000 |
| 8702870 |
Superimposition of rapid periodic and extensive post multiple substrate UV-ozone clean sequences for high throughput and stable substrate to substrate performance |
Sang In Yi, Kelvin Chan, Alexandros T. Demos |
2014-04-22 |
$38,526,000 |
| 8679987 |
Deposition of an amorphous carbon layer with high film density and high etch selectivity |
Patrick Reilly, Shahid Shaikh, Tersem Summan, Deenesh Padhi, Sanjeev Baluja +3 more |
2014-03-25 |
$18,865,000 |
| 8597011 |
Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections |
Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ashish Shah, Inna Shmurun |
2013-12-03 |
$15,303,000 |
| 8591699 |
Method and system for supplying a cleaning gas into a process chamber |
Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez +2 more |
2013-11-26 |
$19,899,000 |
| 8563095 |
Silicon nitride passivation layer for covering high aspect ratio features |
Nagarajan Rajagopalan, Xinhai Han, Ryan Yamase, Ji Ae Park, Shamik Patel +5 more |
2013-10-22 |
$10,239,000 |
