TN

Thomas Nowak

Applied Materials: 53 patents #144 of 7,310Top 2%
UN Unknown: 2 patents #12,644 of 83,584Top 20%
Overall (All Time): #44,247 of 4,157,543Top 2%
56
Patents All Time

Issued Patents All Time

Showing 25 most recent of 56 patents

Patent #TitleCo-InventorsDate
11898249 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2024-02-13
11613812 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2023-03-28
11133210 Dual temperature heater Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap +1 more 2021-09-28
10793954 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2020-10-06
10774423 Tunable ground planes in plasma chambers Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Mark Fodor, Dale R. Du Bois, Amit Kumar BANSAL +4 more 2020-09-15
10570517 Apparatus and method for UV treatment, chemical treatment, and deposition Amit Kumar BANSAL, Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Scott A. Hendrickson 2020-02-25
10522375 Monitoring system for deposition and method of operation thereof Edward W. Budiarto, Majeed A. Foad, Ralf Hofmann, Todd Egan, Mehdi Vaez-Iravani 2019-12-31
10325799 Dual temperature heater Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap +1 more 2019-06-18
10094486 Method and system for supplying a cleaning gas into a process chamber Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez +2 more 2018-10-09
10060032 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2018-08-28
10030306 PECVD apparatus and process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2018-07-24
9870935 Monitoring system for deposition and method of operation thereof Edward W. Budiarto, Majeed A. Foad, Ralf Hofmann, Todd Egan, Mehdi Vaez-Iravani 2018-01-16
9816187 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2017-11-14
9506145 Method and hardware for cleaning UV chambers Sanjeev Baluja, Alexandros T. Demos, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson +6 more 2016-11-29
9458537 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2016-10-04
9364871 Method and hardware for cleaning UV chambers Sanjeev Baluja, Alexandros T. Demos, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson +6 more 2016-06-14
9206511 Method and system for supplying a cleaning gas into a process chamber Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez +2 more 2015-12-08
9157730 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2015-10-13
8911553 Quartz showerhead for nanocure UV chamber Sanjeev Baluja, Juan Carlos Rocha-Alvarez, Alexandros T. Demos, Jianhua Zhou 2014-12-16
8778813 Confined process volume PECVD chamber Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Mark Fodor +6 more 2014-07-15
8702870 Superimposition of rapid periodic and extensive post multiple substrate UV-ozone clean sequences for high throughput and stable substrate to substrate performance Sang In Yi, Kelvin Chan, Alexandros T. Demos 2014-04-22
8679987 Deposition of an amorphous carbon layer with high film density and high etch selectivity Patrick Reilly, Shahid Shaikh, Tersem Summan, Deenesh Padhi, Sanjeev Baluja +3 more 2014-03-25
8597011 Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ashish Shah, Inna Shmurun 2013-12-03
8591699 Method and system for supplying a cleaning gas into a process chamber Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez +2 more 2013-11-26
8563095 Silicon nitride passivation layer for covering high aspect ratio features Nagarajan Rajagopalan, Xinhai Han, Ryan Yamase, Ji Ae Park, Shamik Patel +5 more 2013-10-22