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USPTO Patent Rankings Data through Dec 31, 2025
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Patrick Reilly — 15 Patents

Applied Materials: 15 patents #912 of 7,310Top 15%
Pleasanton, CA: #460 of 3,062 inventorsTop 20%
California: #40,789 of 386,348 inventorsTop 15%
Overall (All Time): #307,048 of 4,157,543Top 8%
15 Patents All Time
Patrick Reilly has been granted 15 US patents while listed as an inventor at Applied Materials. The first was granted in 2013 and the most recent in February 2024. Patrick Reilly ranks #307,048 of 4,157,543 US inventors in our database (top 7.4%). Patent records list Patrick Reilly in Pleasanton, CA, US.

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
11898249 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2024-02-13 $47,589,000
11613812 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2023-03-28 $69,791,000
10793954 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2020-10-06 $62,697,000
10074534 Ultra-conformal carbon film deposition Swayambhu Prasad Behera, Shahid Shaikh, Pramit Manna, Mandar B. Pandit, Tersem Summan +4 more 2018-09-11 $27,448,000
10060032 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2018-08-28 $23,630,000
10030306 PECVD apparatus and process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2018-07-24 $37,876,000
9816187 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2017-11-14 $27,960,000
9748093 Pulsed nitride encapsulation David Alan Bethke, Mihaela Balseanu 2017-08-29 $19,098,000
9721784 Ultra-conformal carbon film deposition Swayambhu Prasad Behera, Shahid Shaikh, Pramit Manna, Mandar B. Pandit, Tersem Summan +4 more 2017-08-01 $22,439,000
9646818 Method of forming planar carbon layer by applying plasma power to a combination of hydrocarbon precursor and hydrogen-containing precursor David Alan Bethke, Kwangduk Douglas Lee 2017-05-09 $25,128,000
9458537 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2016-10-04 $14,162,000
9157730 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2015-10-13 $9,629,000
8778813 Confined process volume PECVD chamber Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Mark Fodor +6 more 2014-07-15 $20,143,000
8679987 Deposition of an amorphous carbon layer with high film density and high etch selectivity Shahid Shaikh, Tersem Summan, Deenesh Padhi, Sanjeev Baluja, Juan Carlos Rocha-Alvarez +3 more 2014-03-25 $18,865,000
8513129 Planarizing etch hardmask to increase pattern density and aspect ratio Martin Jay Seamons, Kwangduk Douglas Lee, Chiu Chan, Sudha Rathi 2013-08-20 $8,967,000