PR

Patrick Reilly

Applied Materials: 15 patents #903 of 7,310Top 15%
Overall (All Time): #311,114 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11898249 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2024-02-13
11613812 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2023-03-28
10793954 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2020-10-06
10074534 Ultra-conformal carbon film deposition Swayambhu Prasad Behera, Shahid Shaikh, Pramit Manna, Mandar B. Pandit, Tersem Summan +4 more 2018-09-11
10060032 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2018-08-28
10030306 PECVD apparatus and process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2018-07-24
9816187 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2017-11-14
9748093 Pulsed nitride encapsulation David Alan Bethke, Mihaela Balseanu 2017-08-29
9721784 Ultra-conformal carbon film deposition Swayambhu Prasad Behera, Shahid Shaikh, Pramit Manna, Mandar B. Pandit, Tersem Summan +4 more 2017-08-01
9646818 Method of forming planar carbon layer by applying plasma power to a combination of hydrocarbon precursor and hydrogen-containing precursor David Alan Bethke, Kwangduk Douglas Lee 2017-05-09
9458537 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2016-10-04
9157730 PECVD process Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more 2015-10-13
8778813 Confined process volume PECVD chamber Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Mark Fodor +6 more 2014-07-15
8679987 Deposition of an amorphous carbon layer with high film density and high etch selectivity Shahid Shaikh, Tersem Summan, Deenesh Padhi, Sanjeev Baluja, Juan Carlos Rocha-Alvarez +3 more 2014-03-25
8513129 Planarizing etch hardmask to increase pattern density and aspect ratio Martin Jay Seamons, Kwangduk Douglas Lee, Chiu Chan, Sudha Rathi 2013-08-20