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PECVD process |
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2024-02-13 |
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PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2023-03-28 |
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PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2020-10-06 |
| 10074534 |
Ultra-conformal carbon film deposition |
Swayambhu Prasad Behera, Shahid Shaikh, Pramit Manna, Mandar B. Pandit, Tersem Summan +4 more |
2018-09-11 |
| 10060032 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2018-08-28 |
| 10030306 |
PECVD apparatus and process |
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2018-07-24 |
| 9816187 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2017-11-14 |
| 9748093 |
Pulsed nitride encapsulation |
David Alan Bethke, Mihaela Balseanu |
2017-08-29 |
| 9721784 |
Ultra-conformal carbon film deposition |
Swayambhu Prasad Behera, Shahid Shaikh, Pramit Manna, Mandar B. Pandit, Tersem Summan +4 more |
2017-08-01 |
| 9646818 |
Method of forming planar carbon layer by applying plasma power to a combination of hydrocarbon precursor and hydrogen-containing precursor |
David Alan Bethke, Kwangduk Douglas Lee |
2017-05-09 |
| 9458537 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2016-10-04 |
| 9157730 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2015-10-13 |
| 8778813 |
Confined process volume PECVD chamber |
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2014-07-15 |
| 8679987 |
Deposition of an amorphous carbon layer with high film density and high etch selectivity |
Shahid Shaikh, Tersem Summan, Deenesh Padhi, Sanjeev Baluja, Juan Carlos Rocha-Alvarez +3 more |
2014-03-25 |
| 8513129 |
Planarizing etch hardmask to increase pattern density and aspect ratio |
Martin Jay Seamons, Kwangduk Douglas Lee, Chiu Chan, Sudha Rathi |
2013-08-20 |