| 11136665 |
Shadow ring for modifying wafer edge and bevel deposition |
Dale Du Bois, Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Mark Fodor +6 more |
2021-10-05 |
$94,201,000 |
| 10227695 |
Shadow ring for modifying wafer edge and bevel deposition |
Dale R. Du Bois, Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Mark Fodor +6 more |
2019-03-12 |
$40,470,000 |
| 9873105 |
Sorbent material and a method for enhancing sorption performance thereof |
Chun-Sing Lee, Yong Tang, Fu-Lung Wong |
2018-01-23 |
|
| 9653327 |
Methods of removing a material layer from a substrate using water vapor treatment |
Kwangduk Douglas Lee, Sudha Rathi, Martin Jay Seamons, Bok Heon Kim |
2017-05-16 |
$17,932,000 |
| 9337072 |
Apparatus and method for substrate clamping in a plasma chamber |
Ganesh Balasubramanian, Amit Kumar BANSAL, Eller Y. Juco, Mohamad A. Ayoub, Hyung Joon Kim +11 more |
2016-05-10 |
$10,962,000 |
| 8993454 |
Ultra high selectivity doped amorphous carbon strippable hardmask development and integration |
Martin Jay Seamons, Sudha Rathi, Kwangduk Douglas Lee, Deenesh Padhi, Bok Hoen Kim |
2015-03-31 |
$7,138,000 |
| 8536065 |
Ultra high selectivity doped amorphous carbon strippable hardmask development and integration |
Martin Jay Seamons, Sudha Rathi, Kwangduk Douglas Lee, Deenesh Padhi, Bok Hoen Kim |
2013-09-17 |
$7,314,000 |
| 8513129 |
Planarizing etch hardmask to increase pattern density and aspect ratio |
Martin Jay Seamons, Kwangduk Douglas Lee, Patrick Reilly, Sudha Rathi |
2013-08-20 |
$8,967,000 |
| 8361906 |
Ultra high selectivity ashable hard mask film |
Kwangduk Douglas Lee, Martin Jay Seamons, Sudha Rathi, Michael H. Lin |
2013-01-29 |
$6,154,000 |
| 8282734 |
Methods to improve the in-film defectivity of PECVD amorphous carbon films |
Deenesh Padhi, Sudha Rathi, Ganesh Balasubramanian, Jianhua Zhou, Karthik Janakiraman +4 more |
2012-10-09 |
$6,230,000 |
| 8197636 |
Systems for plasma enhanced chemical vapor deposition and bevel edge etching |
Ashish Shah, Dale R. DuBois, Ganesh Balasubramanian, Mark Fodor, Eui Kyoon Kim +7 more |
2012-06-12 |
$16,616,000 |
| 7922440 |
Apparatus and method for centering a substrate in a process chamber |
Dale R. Du Bois, Ganesh Balasubramanian, Mark Fodor, Karthik Janakiraman |
2011-04-12 |
$6,345,000 |
| 7867578 |
Method for depositing an amorphous carbon film with improved density and step coverage |
Deenesh Padhi, Hyoung-Chan Ha, Sudha Rathi, Derek R. Witty, Sohyun Park +6 more |
2011-01-11 |
$9,486,000 |
| 7514125 |
Methods to improve the in-film defectivity of PECVD amorphous carbon films |
Deenesh Padhi, Sudha Rathi, Ganesh Balasubramanian, Jianhua Zhou, Karthik Janakiraman +4 more |
2009-04-07 |
$14,489,000 |
| 6468136 |
Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notching |
Robert Lum, David W. Groechel, Li Wu |
2002-10-22 |
$32,970,000 |
