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Shadow ring for modifying wafer edge and bevel deposition |
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Sorbent material and a method for enhancing sorption performance thereof |
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Ultra high selectivity doped amorphous carbon strippable hardmask development and integration |
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Ultra high selectivity doped amorphous carbon strippable hardmask development and integration |
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Planarizing etch hardmask to increase pattern density and aspect ratio |
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Ultra high selectivity ashable hard mask film |
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Systems for plasma enhanced chemical vapor deposition and bevel edge etching |
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Methods to improve the in-film defectivity of PECVD amorphous carbon films |
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Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notching |
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