Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11136665 | Shadow ring for modifying wafer edge and bevel deposition | Dale Du Bois, Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Mark Fodor +6 more | 2021-10-05 |
| 10227695 | Shadow ring for modifying wafer edge and bevel deposition | Dale R. Du Bois, Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Mark Fodor +6 more | 2019-03-12 |
| 9873105 | Sorbent material and a method for enhancing sorption performance thereof | Chun-Sing Lee, Yong Tang, Fu-Lung Wong | 2018-01-23 |
| 9653327 | Methods of removing a material layer from a substrate using water vapor treatment | Kwangduk Douglas Lee, Sudha Rathi, Martin Jay Seamons, Bok Heon Kim | 2017-05-16 |
| 9337072 | Apparatus and method for substrate clamping in a plasma chamber | Ganesh Balasubramanian, Amit Kumar BANSAL, Eller Y. Juco, Mohamad A. Ayoub, Hyung Joon Kim +11 more | 2016-05-10 |
| 8993454 | Ultra high selectivity doped amorphous carbon strippable hardmask development and integration | Martin Jay Seamons, Sudha Rathi, Kwangduk Douglas Lee, Deenesh Padhi, Bok Hoen Kim | 2015-03-31 |
| 8536065 | Ultra high selectivity doped amorphous carbon strippable hardmask development and integration | Martin Jay Seamons, Sudha Rathi, Kwangduk Douglas Lee, Deenesh Padhi, Bok Hoen Kim | 2013-09-17 |
| 8513129 | Planarizing etch hardmask to increase pattern density and aspect ratio | Martin Jay Seamons, Kwangduk Douglas Lee, Patrick Reilly, Sudha Rathi | 2013-08-20 |
| 8361906 | Ultra high selectivity ashable hard mask film | Kwangduk Douglas Lee, Martin Jay Seamons, Sudha Rathi, Michael H. Lin | 2013-01-29 |
| 8282734 | Methods to improve the in-film defectivity of PECVD amorphous carbon films | Deenesh Padhi, Sudha Rathi, Ganesh Balasubramanian, Jianhua Zhou, Karthik Janakiraman +4 more | 2012-10-09 |
| 8197636 | Systems for plasma enhanced chemical vapor deposition and bevel edge etching | Ashish Shah, Dale R. DuBois, Ganesh Balasubramanian, Mark Fodor, Eui Kyoon Kim +7 more | 2012-06-12 |
| 7922440 | Apparatus and method for centering a substrate in a process chamber | Dale R. Du Bois, Ganesh Balasubramanian, Mark Fodor, Karthik Janakiraman | 2011-04-12 |
| 7867578 | Method for depositing an amorphous carbon film with improved density and step coverage | Deenesh Padhi, Hyoung-Chan Ha, Sudha Rathi, Derek R. Witty, Sohyun Park +6 more | 2011-01-11 |
| 7514125 | Methods to improve the in-film defectivity of PECVD amorphous carbon films | Deenesh Padhi, Sudha Rathi, Ganesh Balasubramanian, Jianhua Zhou, Karthik Janakiraman +4 more | 2009-04-07 |
| 6468136 | Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notching | Robert Lum, David W. Groechel, Li Wu | 2002-10-22 |