Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8492170 | UV assisted silylation for recovery and pore sealing of damaged low K films | Bo Xie, Alexandros T. Demos, Kang Sub Yim, Kelvin Chan | 2013-07-23 |
| 8343881 | Silicon dioxide layer deposited with BDEAS | Yong Won Lee, Vladimir Zubkov, Mei-Yee Shek, Li-Qun Xia, Prahallad Iyengar +4 more | 2013-01-01 |
| 8338809 | Ultraviolet reflector with coolant gas holes and method | Yao-Hung YANG, Tuan Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha +1 more | 2012-12-25 |
| 8329575 | Fabrication of through-silicon vias on silicon wafers | Nagarajan Rajagopalan, Ji Ae Park, Ryan Yamase, Shamik Patel, Li-Qun Xia +5 more | 2012-12-11 |
| 8309421 | Dual-bulb lamphead control methodology | Yao-Hung YANG, Abhijit A. Kangude, Sanjeev Baluja, Michael A. Martinelli, Liliya Krivulina +2 more | 2012-11-13 |
| 8283237 | Fabrication of through-silicon vias on silicon wafers | Nagarajan Rajagopalan, Ji Ae Park, Ryan Yamase, Shamik Patel, Li-Qun Xia +5 more | 2012-10-09 |
| 8274017 | Multifunctional heater/chiller pedestal for wide range wafer temperature control | Lipyeow Yap, Tuan Nguyen, Dale R. Du Bois, Sanjeev Baluja, Juan Carlos Rocha-Alvarez +1 more | 2012-09-25 |
| 8216861 | Dielectric recovery of plasma damaged low-k films by UV-assisted photochemical deposition | Kang Sub Yim, Bo Xie, Alexandros T. Demos | 2012-07-10 |
| 8203126 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson, Dustin W. Ho +2 more | 2012-06-19 |
| 8197636 | Systems for plasma enhanced chemical vapor deposition and bevel edge etching | Ashish Shah, Dale R. DuBois, Ganesh Balasubramanian, Mark Fodor, Eui Kyoon Kim +7 more | 2012-06-12 |
| 7964858 | Ultraviolet reflector with coolant gas holes and method | Yao-Hung YANG, Tuan Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha +1 more | 2011-06-21 |
| 7909595 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections | Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ashish Shah, Inna Shmurun | 2011-03-22 |
| 7777198 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson, Dustin W. Ho +2 more | 2010-08-17 |
| 7723228 | Reduction of hillocks prior to dielectric barrier deposition in Cu damascene | Nagarajan Rajagopalan, Meiyee Shek, Kegang Huang, Bok Hoen Kim, Hichem M'Saad | 2010-05-25 |
| 7699935 | Method and system for supplying a cleaning gas into a process chamber | Ramprakash Sankarakrishnan, Dale R. DuBois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez +2 more | 2010-04-20 |
| 7692171 | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors | Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Tom K. Cho, Hichem M'Saad +2 more | 2010-04-06 |
| 7663121 | High efficiency UV curing system | Juan Carlos Rocha-Alvarez, Andrzej Kaszuba, Scott A. Hendrickson, Dustin W. Ho, Sanjeev Baluja +3 more | 2010-02-16 |
| 7628863 | Heated gas box for PECVD applications | Soovo Sen, Inna Shmurun, Nancy Fung, Brian Hopper, Andrzej Kaszuba +1 more | 2009-12-08 |
| 7589336 | Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors | Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ndanka O. Mukuti | 2009-09-15 |
| 7572337 | Blocker plate bypass to distribute gases in a chemical vapor deposition system | Juan Carlos Rocha-Alvarez, Ganesh Balasubramanian, Tom K. Cho, Deenesh Padhi, Bok Hoen Kim +2 more | 2009-08-11 |
| 7566891 | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors | Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson, Dustin W. Ho +2 more | 2009-07-28 |
| 7554103 | Increased tool utilization/reduction in MWBC for UV curing chamber | Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Andrzej Kaszuba, Ndanka O. Mukuti | 2009-06-30 |
| 7371427 | Reduction of hillocks prior to dielectric barrier deposition in Cu damascene | Nagarajan Rajagopalan, Meiyee Shek, Kegang Huang, Bok Hoen Kim, Hichem M'Saad | 2008-05-13 |
| 6868856 | Enhanced remote plasma cleaning | Ian Latchford, Tsutomu Tanaka, Bok Heon Kim, Ping Xu, Jason K. Foster +2 more | 2005-03-22 |
| 6863019 | Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas | Shamouil Shamouilian, Canfeng Lai, Michael S. Cox, Padmanabhan Krishnaraj, Tsutomu Tanaka +2 more | 2005-03-08 |