Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7970483 | Methods and apparatus for improving operation of an electronic device manufacturing system | Mark W. Curry, Peter I. Porshnev, Allen Fox | 2011-06-28 |
| 7736600 | Apparatus for manufacturing a process abatement reactor | Daniel O. Clark, Robbert M. Vermeulen, Shaun W. Crawford | 2010-06-15 |
| 7700049 | Methods and apparatus for sensing characteristics of the contents of a process abatement reactor | Daniel O. Clark, Robert M. Vermeulen, Shaun W. Crawford | 2010-04-20 |
| 7532952 | Methods and apparatus for pressure control in electronic device manufacturing systems | Mark W. Curry, Peter I. Porshnev | 2009-05-12 |
| 7160521 | Treatment of effluent from a substrate processing chamber | Peter I. Porshnev, Mike Woolston, Christopher L. Aardahl, Rick J. Orth, Kenneth G. Rappe | 2007-01-09 |
| 7004107 | Method and apparatus for monitoring and adjusting chamber impedance | Mandar Mudholkar, William Taylor | 2006-02-28 |
| 6888639 | In-situ film thickness measurement using spectral interference at grazing incidence | Andreas Goebel, Moshe Sarfaty | 2005-05-03 |
| 6863019 | Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas | Shamouil Shamouilian, Canfeng Lai, Michael S. Cox, Padmanabhan Krishnaraj, Tsutomu Tanaka +2 more | 2005-03-08 |
| 6680420 | Apparatus for cleaning an exhaust line in a semiconductor processing system | Ben Pang, David Cheung, William Taylor, Mark Fodor | 2004-01-20 |
| 6517913 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | David Cheung, Judy H. Huang, William Taylor, Mark Fodor, Kevin Fairbairn | 2003-02-11 |
| 6432256 | Implanatation process for improving ceramic resistance to corrosion | — | 2002-08-13 |
| 6366346 | Method and apparatus for optical detection of effluent composition | Thomas Nowak, Dave Silvetti, Stefan Wolff, Russ Newman, Imad Yousif +1 more | 2002-04-02 |
| 6358573 | Mixed frequency CVD process | Mandar Mudholkar, William Taylor, Mark Fodor, Judy H. Huang, David Silvetti +2 more | 2002-03-19 |
| 6354241 | Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing | Tsutomu Tanaka, Chau Nguyen, Hari Ponnekanti, Kevin Fairbairn, Mark Fodor | 2002-03-12 |
| 6193802 | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment | Ben Pang, David Cheung, William Taylor, Mark Fodor | 2001-02-27 |
| 6194628 | Method and apparatus for cleaning a vacuum line in a CVD system | Ben Pang, David Cheung, William Taylor, Mark Fodor | 2001-02-27 |
| 6187072 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | David Cheung, Judy H. Huang, William Taylor, Mark Fodor, Kevin Fairbairn | 2001-02-13 |
| 6162709 | Use of an asymmetric waveform to control ion bombardment during substrate processing | Mandar Mudholkar | 2000-12-19 |
| 6136388 | Substrate processing chamber with tunable impedance | Mandar Mudholkar, William Taylor | 2000-10-24 |
| 6098568 | Mixed frequency CVD apparatus | Mandar Mudholkar, William Taylor, Mark Fodor, Judy H. Huang, David Silvetti +2 more | 2000-08-08 |
| 6045618 | Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment | Tsutomu Tanaka, Mukul Kelkar, Hari Ponnekanti, Kevin Fairbairn, David Cheung | 2000-04-04 |
| 6041734 | Use of an asymmetric waveform to control ion bombardment during substrate processing | Mandar Mudholkar | 2000-03-28 |
| 5319653 | Integrated optical component structure | Pierre-Noel Favennec, Helene L'Haridon, Danielle Moutonnet, Albert Barriere, Bruno Nombelli | 1994-06-07 |