Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9566030 | Optical system for detection and characterization of abnormal tissue and cells | Amir Lev | 2017-02-14 |
| 9554743 | Methods for optical identification and characterization of abnormal tissue and cells | Amir Lev | 2017-01-31 |
| 8865076 | Methods for detection and characterization of abnormal tissue and cells using an electrical system | Amir Lev | 2014-10-21 |
| 8437845 | Electrical methods for detection and characterization of abnormal tissue and cells | Amir Lev | 2013-05-07 |
| 8417328 | Electrical systems for detection and characterization of abnormal tissue and cells | Amir Lev | 2013-04-09 |
| 7970588 | Method, system and medium for controlling manufacturing process using adaptive models based on empirical data | Yuri Kokotov, Alexander T. Schwarm, Efim Entin, Jacques Seror, Jehuda Hartman +2 more | 2011-06-28 |
| 7668702 | Method, system and medium for controlling manufacturing process using adaptive models based on empirical data | Yuri Kokotov, Alexander T. Schwarm, Efim Entin, Jacques Seror, Jehuda Hartman +2 more | 2010-02-23 |
| 7358494 | Material composition analysis system and method | Ying Gao | 2008-04-15 |
| 7046019 | Direct non contact measurement | Sven Hermann | 2006-05-16 |
| 7042558 | Eddy-optic sensor for object inspection | Ramaswamy Sreenivasan, Jaim Nulman | 2006-05-09 |
| 6936842 | Method and apparatus for process monitoring | Suraj Rengarajan, Michael Anthony Wood, Haojiang Li, Kevin Song | 2005-08-30 |
| 6896763 | Method and apparatus for monitoring a process by employing principal component analysis | Lalitha Balasubramhanya, Jed Davidow, Dimitris Lymberopoulos | 2005-05-24 |
| 6888639 | In-situ film thickness measurement using spectral interference at grazing incidence | Andreas Goebel, Sebastien Raoux | 2005-05-03 |
| 6855569 | Current leakage measurement | — | 2005-02-15 |
| 6843881 | Detecting chemiluminescent radiation in the cleaning of a substrate processing chamber | Bok Hoen Kim, Nam Le, Martin Jay Seamons, Ameeta Madhava, Michael P. Nault +2 more | 2005-01-18 |
| 6745095 | Detection of process endpoint through monitoring fluctuation of output data | Yuval Ben-Dov, Alexander V. Garachtchenko | 2004-06-01 |
| 6633391 | Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopy | Hakeem Oluseyi | 2003-10-14 |
| 6627463 | Situ measurement of film nitridation using optical emission spectroscopy | — | 2003-09-30 |
| 6608495 | Eddy-optic sensor for object inspection | Ramaswamy Sreenivasan, Jaim Nulman | 2003-08-19 |
| 6603538 | Method and apparatus employing optical emission spectroscopy to detect a fault in process conditions of a semiconductor processing system | Hakeem Oluseyi | 2003-08-05 |
| 6589869 | Film thickness control using spectral interferometry | Lalitha Balasubramhanya, Jed Davidow, Dimitris Lymberopoulos | 2003-07-08 |
| 6521080 | Method and apparatus for monitoring a process by employing principal component analysis | Lalitha Balasubramhanya, Jed Davidow, Dimitris Lymberopoulos | 2003-02-18 |
| 6455437 | Method and apparatus for monitoring the process state of a semiconductor device fabrication process | Jed Davidow, Dimitris Lymberopoulos | 2002-09-24 |
| 6413867 | Film thickness control using spectral interferometry | Lalitha Balasubramhanya, Jed Davidow, Dimitris Lymberopoulos | 2002-07-02 |
| 6368975 | Method and apparatus for monitoring a process by employing principal component analysis | Lalitha Balasubramhanya, Jed Davidow, Dimitris Lymberopoulos | 2002-04-09 |