Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6943053 | System, method and medium for modeling, monitoring and/or controlling plasma based semiconductor manufacturing processes | — | 2005-09-13 |
| 6933243 | High selectivity and residue free process for metal on thin dielectric gate etch application | Meihua Shen, Yan Du, Nicolas Gani, Oranna Yauw | 2005-08-23 |
| 6633391 | Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopy | Moshe Sarfaty | 2003-10-14 |
| 6603538 | Method and apparatus employing optical emission spectroscopy to detect a fault in process conditions of a semiconductor processing system | Moshe Sarfaty | 2003-08-05 |
| 6579806 | Method of etching tungsten or tungsten nitride in semiconductor structures | Padmapani Nallan | 2003-06-17 |
| 6440870 | Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures | Padmapani Nallan | 2002-08-27 |
| 6423644 | Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures | Padmapani Nallan | 2002-07-23 |