Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7265382 | Method and apparatus employing integrated metrology for improved dielectric etch efficiency | Gary Hsueh, Sukesh Mohan | 2007-09-04 |
| 7006205 | Method and system for event detection in plasma processes | Ashish Agarwal | 2006-02-28 |
| 6896763 | Method and apparatus for monitoring a process by employing principal component analysis | Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow | 2005-05-24 |
| 6895293 | Fault detection and virtual sensor methods for tool fault monitoring | Terry Reiss | 2005-05-17 |
| 6625513 | Run-to-run control over semiconductor processing tool based upon mirror image target | Terry Reiss, Arulkumar Shanmugasundram | 2003-09-23 |
| 6589869 | Film thickness control using spectral interferometry | Moshe Sarfaty, Lalitha Balasubramhanya, Jed Davidow | 2003-07-08 |
| 6521080 | Method and apparatus for monitoring a process by employing principal component analysis | Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow | 2003-02-18 |
| 6455437 | Method and apparatus for monitoring the process state of a semiconductor device fabrication process | Jed Davidow, Moshe Sarfaty | 2002-09-24 |
| 6413867 | Film thickness control using spectral interferometry | Moshe Sarfaty, Lalitha Balasubramhanya, Jed Davidow | 2002-07-02 |
| 6368975 | Method and apparatus for monitoring a process by employing principal component analysis | Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow | 2002-04-09 |
| 6247425 | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Peter Loewenhardt, John M. Yamartino | 2001-06-19 |
| 6085688 | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Peter Loewenhardt, John M. Yamartino | 2000-07-11 |