{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Applied Materials", "item": "https://www.patentleaderboard.com/company/applied-materials"}, {"@type": "ListItem", "position": 3, "name": "Dimitris Lymberopoulos", "item": "https://www.patentleaderboard.com/inventor/fl:di_ln:lymberopoulos-1"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Applied Materials › Dimitris Lymberopoulos
DL

Dimitris Lymberopoulos — 12 Patents

Applied Materials: 11 patents #1,208 of 7,310Top 20%
Santa Clara, CA: #1,471 of 9,301 inventorsTop 20%
California: #51,404 of 386,348 inventorsTop 15%
Overall (All Time): #396,045 of 4,157,543Top 10%
12 Patents All Time
Dimitris Lymberopoulos has been granted 12 US patents while listed as an inventor at Applied Materials. The first was granted in 2000 and the most recent in September 2007. Dimitris Lymberopoulos ranks #396,045 of 4,157,543 US inventors in our database (top 9.5%). Patent records list Dimitris Lymberopoulos in Santa Clara, CA, US.

Patents per Year

Patents granted per year, 2000 to 2007Bar chart with a peak of 3 patents in 2002.peak 32000: 1 patents20002001: 1 patents20012002: 3 patents20022003: 3 patents20032005: 2 patents20052006: 1 patents20062007: 1 patents2007

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
7265382 Method and apparatus employing integrated metrology for improved dielectric etch efficiency Gary Hsueh, Sukesh Mohan 2007-09-04 $16,959,000
7006205 Method and system for event detection in plasma processes Ashish Agarwal 2006-02-28 $21,386,000
6896763 Method and apparatus for monitoring a process by employing principal component analysis Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow 2005-05-24
6895293 Fault detection and virtual sensor methods for tool fault monitoring Terry Reiss 2005-05-17 $19,109,000
6625513 Run-to-run control over semiconductor processing tool based upon mirror image target Terry Reiss, Arulkumar Shanmugasundram 2003-09-23 $28,970,000
6589869 Film thickness control using spectral interferometry Moshe Sarfaty, Lalitha Balasubramhanya, Jed Davidow 2003-07-08 $32,858,000
6521080 Method and apparatus for monitoring a process by employing principal component analysis Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow 2003-02-18 $21,472,000
6455437 Method and apparatus for monitoring the process state of a semiconductor device fabrication process Jed Davidow, Moshe Sarfaty 2002-09-24 $13,765,000
6413867 Film thickness control using spectral interferometry Moshe Sarfaty, Lalitha Balasubramhanya, Jed Davidow 2002-07-02 $21,510,000
6368975 Method and apparatus for monitoring a process by employing principal component analysis Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow 2002-04-09 $34,803,000
6247425 Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor Peter Loewenhardt, John M. Yamartino 2001-06-19 $110,909,000
6085688 Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor Peter Loewenhardt, John M. Yamartino 2000-07-11 $109,336,000

Frequent Collaborators

Moshe Sarfaty6 shared
Jed Davidow6 shared
Lalitha Balasubramhanya5 shared
John M. Yamartino2 shared
Terry Reiss2 shared
Peter Loewenhardt2 shared

Nearby-Ranked Inventors

John Patrick Hickey, III12
Gregory Lutter12
Josselin Xavier COUPARD12
Xuan Li12
Nandana Mihindukulasooriya12
Keiichi Matsuda12
Robert Imig12
Peter Mage12
Sze Ping Ching12