Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8676367 | Lot process order modification to improve detection of manufacturing effects | — | 2014-03-18 |
| 8257546 | Method and system for monitoring an etch process | Matthew F. Davis, Lei Lian | 2012-09-04 |
| 8010225 | Method and system of monitoring manufacturing equipment | — | 2011-08-30 |
| 7624003 | Split-phase chamber modeling for chamber matching and fault detection | — | 2009-11-24 |
| 6673199 | Shaping a plasma with a magnetic field to control etch rate uniformity | Peter Loewenhardt, Dmitry Lubomirsky, Saravjeet Singh | 2004-01-06 |
| 6635577 | Method for reducing topography dependent charging effects in a plasma enhanced semiconductor wafer processing system | Peter K. Loewengardt, Kenlin Huang, Diana Xiaobing Ma | 2003-10-21 |
| 6569775 | Method for enhancing plasma processing performance | Peter Loewenhardt, Hui Chen, Diana Xiaobing Ma | 2003-05-27 |
| 6566272 | Method for providing pulsed plasma during a portion of a semiconductor wafer process | Alex Paterson, Peter Loewenhardt, Wade Zawalski | 2003-05-20 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Gerald Yin, Arnold Kolandenko, Hong Ching Shan, Peter Loewenhardt, Chii Guang Lee +9 more | 2002-03-05 |
| 6247425 | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Dimitris Lymberopoulos, Peter Loewenhardt | 2001-06-19 |
| 6085688 | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Dimitris Lymberopoulos, Peter Loewenhardt | 2000-07-11 |