Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date | Approx Value ⓘ |
|---|---|---|---|---|
| 6689930 | Method and apparatus for cleaning an exhaust line in a semiconductor processing system | David Cheung, William Taylor, Sebastion Raoux, Mark Fodor | 2004-02-10 | $27,822,000 |
| 6680420 | Apparatus for cleaning an exhaust line in a semiconductor processing system | David Cheung, William Taylor, Sebastien Raoux, Mark Fodor | 2004-01-20 | $55,713,000 |
| 6193802 | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment | David Cheung, William Taylor, Sebastien Raoux, Mark Fodor | 2001-02-27 | $52,416,000 |
| 6194628 | Method and apparatus for cleaning a vacuum line in a CVD system | David Cheung, William Taylor, Sebastien Raoux, Mark Fodor | 2001-02-27 | $52,416,000 |