Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7629031 | Plasma enhanced bonding for improving adhesion and corrosion resistance of deposited films | Deepak Upadhyaya, William J. Boardman, Karthik Boinapally | 2009-12-08 |
| 6635114 | High temperature filter for CVD apparatus | Jun Zhao, Frank Chang, Xiaoliang Jin, Po Tang | 2003-10-21 |
| 6616767 | High temperature ceramic heater assembly with RF capability | Jun Zhao, Talex Sajoto, Harold Mortensen, Richard Palicka | 2003-09-09 |
| 6527865 | Temperature controlled gas feedthrough | Talex Sajoto, Leonid Selyutin, Jun Zhao, Vincent Ku, Xiao Liang Jin | 2003-03-04 |
| 6358810 | Method for superior step coverage and interface control for high K dielectric capacitors and related electrodes | John C. Egermeier, Nitin Khurana | 2002-03-19 |
| 6270859 | Plasma treatment of titanium nitride formed by chemical vapor deposition | Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Lee Luo +4 more | 2001-08-07 |
| 6258170 | Vaporization and deposition apparatus | Sasson Somekh, Jun Zhao, Talex Sajoto, Leonid Selyutin, Vincent Ku +3 more | 2001-07-10 |
| 6214160 | Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers | Anand Gupta, Gerald Girard | 2001-04-10 |
| 6210485 | Chemical vapor deposition vaporizer | Jun Zhao, Lee Luo, Xiaoliang Jin, Frank Chang, Po Tang | 2001-04-03 |
| 6165271 | Temperature controlled process and chamber lid | Jun Zhao, Sasson Somekh, Talex Sajoto, Leonid Selyutin | 2000-12-26 |
| 6129044 | Apparatus for substrate processing with improved throughput and yield | Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Lee Luo +4 more | 2000-10-10 |
| 6123773 | Gas manifold | Talex Sajoto, Leonid Selyutin, Jun Zhao | 2000-09-26 |
| 6099651 | Temperature controlled chamber liner | Talex Sajoto, Jun Zhao, Leonid Selyutin | 2000-08-08 |
| 6096134 | Liquid delivery system | Jun Zhao, Vincent Ku, Frank Chang, Visweswaren Sivaramakrishnan | 2000-08-01 |
| 6082714 | Vaporization apparatus and process | Jun Zhao, Vincent Ku, Po Tang, Talex Sajoto, Frank Chang | 2000-07-04 |
| 6077562 | Method for depositing barium strontium titanate | Jun Zhao, Talex Sajoto, Lee Luo | 2000-06-20 |
| 6066209 | Cold trap | Talex Sajoto, Jun Zhao, Vincent Ku | 2000-05-23 |
| 6063199 | Temperature controlled liner | Talex Sajoto, Leonid Selyutin, Vincent Ku, Jun Zhao | 2000-05-16 |
| 6056823 | Temperature controlled gas feedthrough | Talex Sajoto, Leonid Selyutin, Jun Zhao | 2000-05-02 |
| 5994678 | Apparatus for ceramic pedestal and metal shaft assembly | Jun Zhao, Talex Sajoto, Leonid Selyutin, Stefan Wolff, Lee Luo +1 more | 1999-11-30 |
| 5968379 | High temperature ceramic heater assembly with RF capability and related methods | Jun Zhao, Talex Sajoto, Leonid Selyutin, Stefan Wolff, Lee Luo +2 more | 1999-10-19 |
| 5964947 | Removable pumping channel liners within a chemical vapor deposition chamber | Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Lee Luo +4 more | 1999-10-12 |
| 5959409 | Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method protecting such heated metal surfaces | John M. White, Craig Bercaw, Hiroyuki Steven Tomosawa, Mark Fodor | 1999-09-28 |
| 5882424 | Plasma cleaning of a CVD or etch reactor using a low or mixed frequency excitation field | Brad Taylor, Turgut Sahin, Fritz Redeker | 1999-03-16 |
| 5853607 | CVD processing chamber | Jun Zhao, Tom K. Cho, Stefan Wolff, Kevin Fairbairn, Xin Sheng Guo +2 more | 1998-12-29 |