Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor processing equipment having improved process drift control

Semiconductor processing equipment having improved process drift control

US Patent 6881608 · Granted Apr 19, 2005

Estimated economic value: $37,257,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Inductive plasma processor having coil with plural windings and method of contro2006
Semiconductor processing equipment having improved process drift control2004
Low contamination high density plasma etch chambers and methods for making the s2003
Inductive plasma processor including current sensor for plasma excitation coil2003
Stacked RF excitation coil for inductive plasma processor2003
Multiple coil antenna for inductively-coupled plasma generation systems2002
Contamination controlling method and apparatus for a plasma processing chamber2002
Low contamination high density plasma etch chambers and methods for making the s2002
Apparatus for reducing polymer deposition on substrate support2001
Particle controlling method for a plasma processing chamber2001
Semiconductor processing equipment having radiant heated ceramic liner2001
Multiple coil antenna for inductively-coupled plasma generation systems2000