Issued Patents All Time
Showing 51–75 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6824627 | Stepped upper electrode for plasma processing uniformity | Rajinder Dhindsa, Mukund Srinivasan, Aaron Eppler | 2004-11-30 |
| 6786175 | Showerhead electrode design for semiconductor processing reactor | Rajinder Dhindsa | 2004-09-07 |
| 6716762 | Plasma confinement by use of preferred RF return path | — | 2004-04-06 |
| 6712929 | Deformation reduction at the main chamber | Albert R. Ellingboe, Fangli Hao | 2004-03-30 |
| 6669811 | Linear drive system for use in a plasma processing system | Fangli Hao, Keith Dawson | 2003-12-30 |
| 6602381 | Plasma confinement by use of preferred RF return path | — | 2003-08-05 |
| 6536777 | Sealing techniques suitable for different geometries and constrained spaces | Fangli Hao, Keith Dawson | 2003-03-25 |
| 6432831 | Gas distribution apparatus for semiconductor processing | Rajinder Dhindsa, Fangli Hao | 2002-08-13 |
| 6433484 | Wafer area pressure control | Fangli Hao, Bruno Morel | 2002-08-13 |
| 6389677 | Perimeter wafer lifting | — | 2002-05-21 |
| 6391787 | Stepped upper electrode for plasma processing uniformity | Rajinder Dhindsa, Mukund Srinivasan, Aaron Eppler | 2002-05-21 |
| 6363882 | Lower electrode design for higher uniformity | Fangli Hao, Albert R. Ellingboe | 2002-04-02 |
| 6305677 | Perimeter wafer lifting | — | 2001-10-23 |
| 6245192 | Gas distribution apparatus for semiconductor processing | Rajinder Dhindsa, Fangli Hao | 2001-06-12 |
| 6239403 | Power segmented electrode | Robert D. Dible, Albert M. Lambson | 2001-05-29 |
| 6042686 | Power segmented electrode | Robert D. Dible, Albert M. Lambson | 2000-03-28 |
| 6019060 | Cam-based arrangement for positioning confinement rings in a plasma processing chamber | — | 2000-02-01 |
| 5998932 | Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber | — | 1999-12-07 |
| 5942074 | Single-piece gas director for plasma reactors | Keith Dawson | 1999-08-24 |
| 5933314 | Method and an apparatus for offsetting plasma bias voltage in bi-polar electro-static chucks | Albert M. Lambson, Rick Caple, Laura M. Braun, Ricky Marsh | 1999-08-03 |
| 5714031 | Topology induced plasma enhancement for etched uniformity improvement | Randall S. Mundt, David Kerr | 1998-02-03 |
| 5656122 | Shadow clamp | Henry Brumbach | 1997-08-12 |
| 5609720 | Thermal control of semiconductor wafer during reactive ion etching | Keith Dawson | 1997-03-11 |
| 5569356 | Electrode clamping assembly and method for assembly and use thereof | Michael L. Calvisi, Ivo A. Miller, Robert A. Frazier | 1996-10-29 |
| 5534751 | Plasma etching apparatus utilizing plasma confinement | Robert D. Dible | 1996-07-09 |